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  • 1995-1999  (1)
  • 1985-1989  (2)
  • 1
    ISSN: 1432-1041
    Keywords: Key words Drug utilization ; Prescribing behaviour; repeat prescribing ; general practitioners
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Medicine
    Notes: Abstract Objective: To determine to what extent general practitioners’ (GPs) prescribing behaviour is a result of repeat prescribing of medication which has been initiated by specialists. Method: During a 4-week period, pharmacists identified GPs’ prescriptions for a large group of cardiovascular drugs. Next, questionnaires were sent to the prescribing GPs to find out whether the prescriptions were in fact repeat prescriptions. If they were, the GPs were asked whether or not they had originally been prescribed by a specialist. Setting: Six pharmacies in the northeastern part of the Netherlands. Subjects: Fourty-four GPs, 39 of whom responded. Results: Of 1648 questionnaires, 1342 (81%) were returned. Of drugs for cardiovascular therapy that the GPs prescribed, 66% had originally been prescribed by specialists. Conclusions: For many cardiovascular drugs, GPs’ prescriptions predominantly originated from specialists’ prescribing. For more reliable attribution of prescription data or prescribing behaviour to either specialists or to GPs, similar studies should be made for other drug groups. Since the extent of repeat prescribing is high, qualitative studies should be made of the appropriateness of chronic medication, initiated by specialists and continued in repeat prescribing by GPs.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 58 (1985), S. 2074-2076 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: It is demonstrated that the measured value of the self-bias voltage on electrodes with an insulating target plate in a radio-frequency dry etching system is strongly influenced by the configuration of the electrode, and may have no straightforward relation with the actual self-bias voltage between the target surface and ground. The mechanism allowing measurement of the self-bias voltage is identified as plasma-induced surface conduction on the insulating target plate assisted by high electric fields at the target plate edge.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 57 (1985), S. 4386-4390 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: It is demonstrated that microwave cutoff can be used to measure absolute electron densities for CHF3, Ar, and O2 plasmas in a batch-mode planar reactor excited at 13.56 MHz. The densities obtained are between 1015 and 1016 m−3 for all gases and a large set of conditions (pressure, rf power, electrode spacing). A comparison with selective etching of SiO2 over Si in the same reactor shows a qualitative agreement between the substrate ion flux calculated from the electron density and the etch rate of silicon oxide; the apparent sputter yield ranges from 0.4 to 1.4 molecules per ion.
    Type of Medium: Electronic Resource
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