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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 81 (1997), S. 30-37 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A numerical simulation of an optically pumped, multimode D2O laser was carried out based on Lamb's semiclassical laser theory. The numerical code includes the dispersion effect of the laser medium (D2O gas in the cavity) in order to simulate the strength of mode coupling accurately. As a result, multiple-longitudinal-mode oscillations around the Raman resonance frequency were obtained that are roughly in agreement with experimental observations. Energy spectra of the D2O laser emission obtained by the simulation were compared with those of the experimental results for various D2O gas pressures. By including the dispersion effect, temporal variations of mode frequencies were calculated. In addition, resonant pumping was examined to obtain spectrally narrow outputs by tuning a frequency of a pump CO2 laser pulse to the line center of the absorption band of D2O molecules. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Spectrally narrow outputs of about 10 MHz (full width at half-maximum) are obtained from an optically pumped high-power (100 kW) D2O laser system by using the oscillator-amplifier configuration, in which a low-power single-mode output from a compact D2O laser with a short cavity length is amplified by a large D2O laser amplifier. In order to obtain spectrally narrow outputs from the amplifier, the following three conditions need to be satisfied: (1) the D2O gas pressure of the amplifier is adjusted in the range from 4 to 6 Torr; (2) the oscillation frequency of the compact laser is tuned in the range about 15–35 MHz lower than the Raman resonance frequency; and (3) the intensity of the compact laser beam injected into the amplifier is larger than about 50 W/cm2. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A Weissenberg camera for macromolecules with imaging plate data collection system at BL6A and BL18B stations in the Photon Factory is introduced and evaluated. The special feature of these systems is considered matching for both SR-x rays and protein crystallography. This system is user-friendly and can collect a large amount of data to higher resolution from the crystal with large unit cell dimensions. A newly developed camera can be used as a time-resolved Laue camera and a Weissenberg camera. A large image reader (IPR4080) that can scan 400×400 mm2 and 400×800 mm2 sizes of imaging plates has been developed and evaluated. The new data collection system combined with the new camera and IPR4080 will be installed at the BL18B station in October 1994. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 5422-5433 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Using oxides as examples, the defect chemistry is systematically analyzed for a low-temperature regime, at which the oxygen exchange equilibrium reaction is no longer reversible, while the internal defect equilibrium reactions (in particular, the electronic transfer processes) may still be reversible. For the partially frozen-in states as well as for the complete equilibrium cases, defect concentrations are numerically calculated for idealized model oxides including pure, acceptor-doped, and donor-doped oxides. Foreign ions (major/minor, shallow/deep, acceptor/donor), oxygen vacancies, and oxygen interstitials are taken into account as redox-active defects. The deep-level (redox-active) defects often dominate defect concentrations in the partially frozen-in states, while the major dopants fix the concentrations in complete equilibrium. The temperature and oxygen partial pressure dependencies of defect concentrations in the partially frozen-in states are discussed. The description does not only allow one to extend the defect chemistry to lower temperatures, such as room temperature, but also offers a quantitative basis for manipulation and prediction of defect concentrations in ionic crystals. Thereby, the physical and chemical performance of such materials may be controlled at temperatures lower than those at which the oxygen nonstoichiometry is established. The results are equally relevant for applications in solid state physics (e.g., compound semiconductors) and in solid state chemistry (e.g., solid electrolytes, mixed conductors). © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 5434-5443 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The low-temperature defect chemistry of oxides is considered, characterized by frozen-in interaction with the ambient oxygen and reversibility of internal interactions, in particular the redistribution of electronic carriers. Analytical relations describing ionic and electronic defect concentrations are derived for various conditions. The presence of redox-active, i.e., deep-level, dopants proves to be of special interest in this context. The analytical relations permit the detailed discussion of the dependencies of the charge carrier concentrations on the control parameters. Such analytical relations are useful for understanding and tailoring defect concentrations and thus related properties of electroceramics. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 70 (1999), S. 76-81 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Vacuum ultraviolet absorption spectroscopy was developed for the measurement of absolute fluorine (F) atom density in reactive plasmas. In order to minimize the influence of radiation trapping (self-absorption) in the light source, fluorescence at a wavelength of 95.85 nm from the F atoms in an electron–cyclotron resonance (ECR) CF4 plasma, which was operated with a low microwave power (0.1 kW) and a low gas pressure (1 mTorr), was employed as the probe emission. A windowless transmission system for the probe emission was constructed by connecting the ECR light source with the target plasma and the detection system using vacuum tubes having small slits. The connection tubes were differentially evacuated with turbomolecular pumps to prevent neutral particles from passing through between the ECR and target plasmas. The present method was applied to high-density CF4 and C4F8 plasmas produced by helicon-wave discharges. The accuracy of the measurement was examined carefully by evaluating various sources of error. In the present article, we have emphasized the evaluation of the radiation trapping effect in the light source plasma. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 83 (1998), S. 7482-7487 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Absolute density and reaction kinetics of fluorine (F) atoms in high-density octafluorocyclobutane (c-C4F8) plasmas were examined using vacuum ultraviolet absorption spectroscopy. The F atom densities, corresponding to electron densities ranging from 1×1011 to 5×1012 cm−3, were 1×1012–5×1013 cm−3 for gas pressures of 2–7 mTorr and rf powers of 0.2–1.5 kW. The F atom density was linearly dependent on the electron density for ne〈1.5×1012 cm−3. According to lifetime measurements in the afterglow, two decay processes were found in the F atom density: exponential (first-order kinetics) and linear (zero-order kinetics) decay components. The linear-decay component became significant at high gas pressures. The time constant of the exponential-decay component ranged from 5 to 100 ms, which corresponds to surface loss probabilities of 10−1–10−3. The surface loss probability varied inversely with the F atom density. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 82 (1997), S. 5321-5326 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Laser-induced fluorescence spectroscopy has been employed for the measurements of the ground-state CF and CF2 radical densities in low-pressure and high-density CF4 plasmas generated by helicon wave discharges. In the pulsed operation (5 Hz, 10 ms duration), the radial profiles of the CF and CF2 densities were hollow shape in the discharge phase, which indicates that both radicals were desorbed from the wall and were lost in the plasma column. In the continuous-wave operation, roughly uniform radial profiles were observed for both radicals. Therefore the desorbed radicals in the pulsed discharge seem to originate from the adsorbed species in the afterglow of the previous discharge. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 82 (1997), S. 5938-5943 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Reaction processes of fluorine (F) atoms in high-density carbon–tetrafluoride (CF4) plasmas were investigated using vacuum ultraviolet absorption spectroscopy. A scaling law nF∝(nenCF4)0.5–0.7 was found experimentally, where nF is the F atom density and ne and nCF4 stand for the electron and parent gas (CF4) densities, respectively. The lifetime measurement in the afterglow showed that the decay curve of the F atom density was composed of two components: a rapid decay in the initial afterglow and an exponential decrease in the late afterglow. The decay time constant in the initial afterglow τ1 satisfied the scaling law τ1∝(nenCF4)−(0.3–0.4), which is a consistent relationship with the scaling law for the F atom density. The two scaling laws and the lifetimes of CFx radicals suggest that the major loss process of F atoms in the initial afterglow is the reaction with CFx radicals (probably, x=3) on the wall surface. The loss process in the late afterglow was simple diffusion to the wall surface. The surface loss probability of F atoms on the chamber wall was evaluated from the decay time constant in the late afterglow, and was on the order of 10−3. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 73 (1998), S. 187-189 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: In situ analysis of the terminating atomic plane of c-axis oriented La0.7Sr0.3MnO3 thin films grown epitaxially on SrTiO3(100) substrate by laser molecular beam epitaxy has been carried out employing coaxial impact-collision ion scattering spectroscopy (CAICISS). The CAICISS time-of-flight spectroscopic studies reveal that the (001) surface of c-axis oriented La0.7Sr0.3MnO3 thin films is predominantly terminated with MnO2 plane. The azimuth rotational CAICISS measurements show a fourfold symmetry in the surface atom alignments establishing the square lattice structure of the terminating plane. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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