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  • 1990-1994  (16)
  • Polymer and Materials Science  (15)
  • 11.30.er  (1)
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  • 1
    Electronic Resource
    Electronic Resource
    Parity violation in the 17/2− isomer of93Tc (1990)
    Springer
    The European physical journal 336 (1990), S. 133-138 
    Details
    ISSN: 1434-601X
    Keywords: 11.30.er ; 23.20.Js ; 29.75. + X
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract The parity-violating mixing of the 17/2− and 17/2+ levels in93Tc nuclei, polarized by the tilted multifoil interaction, was measured by the observation of the forwardbackwardγ-ray asymmetry. The asymmetry was determined to beA γ=1.18(48)×10−3. The nuclear polarization was determined in a measurement of the quadrupole interaction in a92Mo isomer and the parity violation matrix element 〈H PV〉 is found to be ¦〈H PV〉¦ =0.8(4) meV.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01290613
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  • 2
    Electronic Resource
    Electronic Resource
    Charakterisierung keramischer Werkstoffe mit der Auger-Elektronenspektroskopie: Möglichkeiten und Grenzen (1990)
    Weinheim : Wiley-Blackwell
    Materialwissenschaft und Werkstofftechnik 21 (1990), S. 93-104 
    Details
    ISSN: 0933-5137
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Description / Table of Contents: Understanding the relationships between mechanical and other physico-chemical properties and the microstructural chemistry is a necessity for a well-controlled development of new materials. A prerequisite for the achievement of this goal is an advanced microanalytical characterization, which can be obtained by application of surface analysis methods. Among these, high resolution Auger electron spectroscopy (HR-AES or Scanning Auger Microscopy, SAM) has proved to be extremely useful for surface, interface and depth profile analysis of ceramic materials. After a short presentation of the principles and the main areas of application, specific advantages are discussed for some examples. Those are e.g. a depth of information in the nanometer range, a sub-micrometer lateral resolution, a relatively high detection sensitivity for the light elements like B, C, N, O, and a small matrix effect in quantitative analysis. The main disadvantages are due to a variety of detrimental electron beam induced effects which are outlined for some examples of oxide and non-oxide ceramics. The generation of electrical charging of insulating ceramics and its avoidance or reduction by appropriate experimental procedures is particularly emphasized.
    Notes: Das für eine kontrollierte Materialentwicklung benötigte Verständnis des Zusammenhangs zwischen mechanischen und anderen physikalisch-chemischen Eigenschaften und dem mikrostrukturellen Aufbau setzt eine leistungsfähige mikroanalytische Charakterisierung voraus, die vor allem durch den Einsatz oberflächenspezifischer Untersuchungsverfahren erhalten werden kann. Unter diesen hat sich insbesondere die hochauflösende Auger-Elektronenspektroskopie (High Resolution Auger-Electron Spectroscopy, HR-AES bzw. Scanning Auger Microscopy, SAM) in Verbindung mit Oberflächen-, Bruchflächen- und Tiefenprofilanalysen bewährt, deren Grundlagen und Haupteinsatzgebiete unter besonderer Berücksichtigung keramischer Werkstoffe vorgestellt werden. Den Vorteilen kleiner Informationstiefe im Nanometerbereich, der hohen Ortsauflösung im Sub-Mikrometer-Bereich, der vergleichsweise hohen Nachweisempfindlichkeit für leichte Elemente wie B, C, N, O sowie der geringen Matrix-Effekte bei der quantitativen Analyse stehen als Nachteile eine Reihe störender elektronenstrahlinduzierter Effekte gegenüber. Diese werden anhand ausgewählter Beispiele für oxidische- und nichtoxidische Keramiken erläutert, wobei besondere Betonung auf die Entstehung von elektrischen Aufladungen bei nichtleitenden Keramiken und deren Vermeidung bzw. Verminderung durch geeignete experimentelle Maßnahmen gelegt wird.
    Additional Material: 14 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/mawe.19900210302
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  • 3
    Electronic Resource
    Electronic Resource
    Augerspektroskopische Untersuchungen zur Lochkorrosion von Fe-Cr-, Fe-Mo- und Fe-Cr-Mo-LegierungenHerrn Professor Dr. K. E. Heusler zum 60. Geburtstag gewidmet (1991)
    Weinheim [u.a.] : Wiley-Blackwell
    Materials and Corrosion/Werkstoffe und Korrosion 42 (1991), S. 169-178 
    Details
    ISSN: 0947-5117
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Description / Table of Contents: Auger-spectroscopic investigations into pitting corrosion of FeCr, FeMo and FeCrMo alloysA single pit was produced on binary iron-chromium (Fe17Cr), iron-molybdenum (Fe1Mo, Fe3Mo, and Fe5Mo) and ternary iron-chromium-molybdenum alloys (Fe17CrxMo, x = 1, 3, 7 wt.%) in 0.5 M H2SO4 with Cl- additions (0.02 to 0.08 molar) at room temperature. Compositional changes at the bottom of the pit and in the surrounding passive film were determined using high resolution Auger-Electron Spectroscopy (AES). The chromium and molybdenum content of the passive layers are not changed in the presence of Cl- and there is no incorporation of chlorine in the passive film as long as the films were formed in a chlorine-free electrolyte and Cl- was added later. At the bottom of the pits salt films could be determined in all cases after removing the electrolyte with filter paper. These salt films are strongly enriched in chromium, molybdenum and chlorine. The salt film was not detectable for Fe-Cr after rinsing the samples with distilled water, whereas in the case of molybedenum additions the salt film could not be washed away with water.
    Notes: Ein einzelnes Loch wurde auf der passiven Oberfläche von Eisen-Chrom-(Fe17Cr), Eisen-Molybdän-(Fe1Mo, Fe3Mo und Fe5Mo) und ternären Eisen-Chrom-Molybdän-Legierungen (Fe17CrxMo, x = 1, 3, 7 Gew.%) durch Lochkorrosion in 0,5 M H2SO4 mit Cl--Zusätzen von 0,02 und 0,08 Mol/l bei Raumtemperatur erzeugt. Die Zusammensetzung des Lochbodens und der umgebenden Passivschicht wurde mit Hilfe der hochauflösenden Augerelektronenspektroskopie (AES) bestimmt. Der Chrom- und Molybdängehalt des Passivfilmes wird durch die Anwesenheit der Cl--Ionen nicht verändert, und es wird kein Chlor in den Passivfilm eingebaut, solange der Film in chloridfreiem Elektrolyt gebildet und Cl- später zugesetzt wurde. Auf dem Lochboden konnten in allen Fällen Salzfilme festgestellt werden, nachdem der Elektrolyt mit Filterpapier aufgesogen wurde. Diese Salzfilme waren stark mit Chrom, Molybdän und Chlor angereichert. Bei der Fe-Cr-Legierung konnte der Salzfilm nach Spülung mit Wasser nicht mehr nachgewiesen werden, während bei den molybdänhaltigen Legierungen der Salzfilm mit Wasser nicht entfernt werden konnte.
    Additional Material: 12 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/maco.19910420405
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  • 4
    Electronic Resource
    Electronic Resource
    Oxidation behavior of CrNx and (Cr,Al)Nx hard coatings (1990)
    Weinheim [u.a.] : Wiley-Blackwell
    Materials and Corrosion/Werkstoffe und Korrosion 41 (1990), S. 756-760 
    Details
    ISSN: 0947-5117
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Description / Table of Contents: Oxidationsverhalten von Hartstoffschichten aus CrNx und (Cr,Al)NxDurch reaktives Magnetron-Sputtering hergestellte Nitrid-Hartstoffschichten aus CrNx und (Cr,Al)Nx wurden in Luft bei Temperaturen zwischen 500°C und 900°C bis zu 16 Stunden lang oxidiert. Ursprüngliche und oxidierte Proben wurden durch Auger-Elektronenspektroskopie, Rasterelektronenmikroskopie und Röntgenbeugung untersucht. Die Ergebnisse zeigen, daß die Oxidation von Beschichtungen aus CrNx durch das Wachstum einer Chromoxidschicht gekennzeichnet ist, das durch Diffusion von Cr aus der Nitridschicht bestimmt wird. Unterhalb der Oxidschicht entsteht eine an Cr verarmte und mit N angereicherte Schicht. Beschichtungen mit dem ternären (Cr,Al)Nx sind bei allen Temperaturen zwischen 500°C und 900°C etwa fünfmal mehr oxidationsbeständig, als solche aus CrNx. Die Oxidschicht auf (Cr,Al)Nx zeigt eine ausgeprägte Variation der Zusammensetzung mit der Tiefe. Diese kann im wesentlichen durch das Vorherrschen einer äußeren Cr-reichen (Cr,Al)-Oxidschicht gedeutet werden, die sich nach innen zu in einer Al-angereicherten (Cr,Al)-Oxynitridschicht fortsetzt. Im Gegensatz zu CrNx findet man eine breite Interdiffusionszone von N und O. In beiden Fällen wird der Oxidationsvorgang hauptsächlich durch die Diffusion von Cr bestimmt.
    Notes: Reactively magnetron-sputtered CrNx and (Cr,Al)Nx hard costings were oxidized in air at temperatures between 500°C and 900°C for periods up to 16 h. The original and the oxidized samples were characterized by scanning electron microscopy, X-ray diffraction and scanning Auger electron spectroscopy. The results show that CrNx coatings oxidize by growth of chromium oxide layer on top of the coating governed by outward diffusion of Cr. Below the oxide layer, a Cr-depleted and N-enriched intermediate nitride layer is left. The ternary (Cr,Al)Nx nitride coating is about five times more oxidation resistant than CrNx at all temperatures between 500°C and 900°C. The oxide layer on (Cr,Al)Nx shows a strong variation in composition with depth, which can be interpreted as a main oxide layer of a Cr-rich (Cr,Al) oxide followed by an Al-enriched (Cr,Al) oxynitride. In contrast to CrNx, a wide interdiffusion zone of N and O is found. In both cases the oxidation process is mainly controlled by Cr diffusion.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/maco.19900411222
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  • 5
    Electronic Resource
    Electronic Resource
    Determination of the atomic mixing layer in sputter profiling of Ta/Si multilayers by TEM and AES (1990)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 15 (1990), S. 794-796 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Sputter-deposited multilayers of Si and Ta with a nominal period length of a double layer (Ta + Si) of 20 nm were studied with AES depth profiling and with transmission electron microscopy (TEM). The asymmetric shape of the measured Si layer profiles was fitted to model calculations based on preferential sputtering of Si and an atomic mixing zone length of 4 nm for 3 keV Ar+ ions at a 36° incidence angle. TEM images of cross-sections of the original sample show sharp Si/Ta and Ta/Si interfaces, with a width of ∼ 0.5 nm. The atomic mixing zone length of the sputter-profiled sample was observed directly by TEM and was determined to be 4.0 nm, in accordance with the AES profile evaluation. It is concluded that the observed asymmetric broadening of the shape of the measured AES sputtering profiles is due mainly to atomic mixing and is enhanced by preferential sputtering of Si.
    Additional Material: 3 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740151214
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  • 6
    Electronic Resource
    Electronic Resource
    Probing depth of soft x-ray absorption spectroscopy measured in total-electron-yield mode (1992)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 18 (1992), S. 65-69 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Two series of experiments on well-characterized systems were performed to examine the probing depth of soft x-ray absorption spectroscopy (XAS) measured in total-electron-yield (TEY) mode. First we measured the Ni 2p3/2 absorption spectra of Ni(100) covered with Tb as a function of the overlayer thickness. Secondly we recorded the O 1s absorption spectra of Ta2O5 films produced by controlled anodic oxidatio of Ta foils as a function of the oxide thickness. The mean probing depth (MPD) was found to be much shorter than previously assumed (for O 1s, only 1.9 nm). The relative importance of those cascade mechanisms that lead to the electron current measured in TEY is discussed.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740180111
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  • 7
    Electronic Resource
    Electronic Resource
    Temperature dependence of the phosphorus segregation at the twin boundary in an Fe-4 at.% Si alloy (1990)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 16 (1990), S. 546-551 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: AES of in situ fractured bicrystals of an Fe-4 at.% Si alloy containing traces of phosphorus was used to study the temperature dependence of the segregation at the symmetrical {112} (coherent twin) grain boundary between 773 and 1173 K. The observed enrichment of P decreases with temperature, whereas that of Si increases slightly. This behaviour is described by a mutual repulsive interaction coefficient α′ = 92 kJ mol-1 of P and Si and the corre-sponding pure binary segregation enthalpies ΔH0P = -7.9 kJ mol-1 and ΔH0Si = -3.0 kJ mol-1, the absolute values of which are considerably lower than those reported for polycrystalline samples of Fe—P and Fe—Si. The differences are explained on the basis of orientation, concentration and interaction effects.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.7401601113
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  • 8
    Electronic Resource
    Electronic Resource
    Interfacial reactions and silicide formation in Si/Ni/Si and Si/Cr/Si sandwich layersPaper presented at ECASIA 93, Catania, Sicily, 4-8 October 1993. (1994)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 21 (1994), S. 560-565 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The preparation of well-characterized silicide thin films for microelectronics needs a control of interfacial reactions and diffusion processes during heat treatment of metal/semiconductor systems. Two sandwich structures of Si(33 nm)/Me(50 nm)/Si(33 nm), where Me = Ni or Cr, with a total thickness of each structure of 116 nm were sputter deposited onto smooth silicon-(111) substrates. The reactions of both metals with amorphous silicon thin films were activated in a differential scanning calorimeter (DSC), at a heating rate of 40°C/min-1, between room temperature and different higher temperatures. Auguer electron spectroscopy depth profiles showed that the Si/Ni/Si sandwich structure reacted almost completely during heat treatment up to 320°C and formed reaction products with a composition close to Ni3Si2. Selected area diffraction patterns revealed that this is a mixture of Ni2Si and NiSi silicides. A much less pronounced reaction between Si and Cr was observed in the Si/Cr/Si sandwich structure, even with heating to 630°C, resulting in CrSi2 silicide and different Cr-Si solid solutions. The results of AES depth profiling studies of the thermally treated sandwich structures are discussed in terms of diffusion processes, movement of interfaces and formation of silicides. The additional information obtained with differential scanning calorimetry and transmission electron microscopy enables a detailed identification of reaction products formed in the early stage of the thermally treated Si/Me/Si structures.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740210808
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  • 9
    Electronic Resource
    Electronic Resource
    An AES study of particles in the welding fumes of mild and stainless steel (1990)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 16 (1990), S. 563-564 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Additional Material: 1 Tab.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.7401601118
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  • 10
    Electronic Resource
    Electronic Resource
    Grain boundary segregation in [100] symmetrical tilt bicrystals of an Fe—Si alloy (1992)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 19 (1992), S. 601-606 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The orientation and temperature dependences of the segregation of P, Si and C at [100] symmetrical tilt grain boundaries of an Fe-3.5 at.% Si alloy were determined by AES analysis of in situ fractured bicrystals. The obtained anisotropy of the segregation enthalpy of all three elements is characterized by its low absolute values for the {013} and {012} boundaries. Both of these boundaries belong to the low classification levels after Paidar and possess high values of interplanar spacing which can be used as a simple geometric criterion of the boundary ‘specialty’. The data are consistent with the construction of the grain boundary segregation diagram showing the dependence of the segregation enthalpy on both the boundary orientation and the maximum solid solubility of the solute.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.7401901112
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