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  • 1
    Electronic Resource
    Electronic Resource
    Oxidation of NiCr and NiCrFe alloys at room temperature (1988)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 12 (1988), S. 437-438 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Additional Material: 1 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740120719
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    Paper (German National Licenses)
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  • 2
    Electronic Resource
    Electronic Resource
    Factor analysis and superposition of Auger electron spectra applied to room temperature oxidation of Ni and NiCr21Fe12 (1989)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 14 (1989), S. 59-65 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Low energy valence band Auger transitions are advantageous for the study of the initial stages of metal and alloy oxidation owing to their high surface sensitivity and to their chemical bonding features. However, the latter property leads to difficulties in quantification of the spectra, particularly by using peak-to-peak heights in the derivative mode. Therefore, two other methods are applied for a quantitative evaluation of the different elemental bonding states: (a) superposition of standard spectra according to the least mean squares fitting method and (b) factor analysis. The reliability of both methods is compared for the quantitative determination of the kinetics of oxygen reaction with pure Ni and with a NiCr21Fe12 alloy at oxygen pressures between 10-6 Pa and 10-4 Pa. Although both methods give comparable results, only method (b) allows the determination of the chemisorbed oxygen bonding state on Ni using the low energy Ni M23 VV transition. For the NiCrFe alloy, only method (a) gives a clear distinction between nickel and iron oxides.
    Additional Material: 8 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740140113
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    Paper (German National Licenses)
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  • 3
    Electronic Resource
    Electronic Resource
    Determination of depth resolution from measured sputtering profiles of multilayer structures: Equations and approximations (1986)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 8 (1986), S. 87-89 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Equations to extract the depth resolution from measured sputtering profiles of multilayer structures are presented. The range of application and the errors involved are discussed with respect to the ratio between depth resolution and layer thickness.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740080209
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    Paper (German National Licenses)
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  • 4
    Electronic Resource
    Electronic Resource
    Quantitative AES depth profiling of very thin overlayers (1986)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 8 (1986), S. 147-157 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: A model calculation is proposed which quantitatively evaluates measured AES sputtering profiles of very thin overlayers in terms of the original elemental depth distribution. The model is based on the sequential layer sputtering model, including the escape depth of the Auger electrons. A proposal for the incorporation of a site dependent sputtering yield and of preferential sputtering effects is presented and the limitations and capabilities are discussed. Applications to experimental data are shown for oxide films on tantalum, for an oxidefilm on a NiCr20 alloy and for a passive film on FeCr18Ni9.
    Additional Material: 10 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740080403
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  • 5
    Electronic Resource
    Electronic Resource
    Depth resolution improvement in AES sputter profiling of Ni/Cr multilayers on rough substrates using two ion beams (1987)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 10 (1987), S. 7-12 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Three point depth profiling by scanning Auger microscopy and simultaneous sputtering with one ion beam and subsequent addition of a second ion beam, incident from a different direction, is applied to multilayer Ni/Cr structures deposited on a rough (roughness Ra = 2.3 μm) silicon substrate. Depending on the analysed microarea of about 1 μm diameter, depth resolutions between 25 nm and 44 nm at 125 nm sputtered depth were obtained using one ion beam. The extent of the improvement in Δz after sputtering with two ion beams is directly related to the absolute values obtained in each of the three microareas. The results are explained in terms of shadowing and redeposition effects which are diminished by the use of sputtering with two ion guns.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740100103
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  • 6
    Electronic Resource
    Electronic Resource
    Oxidation of NiCr and NiCrFe alloys at room temperaturePaper presented at ECASIA 87, Stuttgart, FRG, 19-23 October 1987. (1988)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 11 (1988), S. 617-626 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The primary stages of the oxidation of NiCr23 and of NiCr21Fe12 and the final oxide layers were studied at room temperature and oxygen pressures between 10-6 Pa and 10-4 Pa using AES and XPS. The composition of the surface during oxygen exposure was monitored by continuous recording of the Auger transitions M23 VV and L3M23V of the metallic components and the KL23L23 transition of oxygen. The low energy M23VV transitions are especially indicative of the present chemical state which is additionally characterized by the 2p photoelectron spectra. After different oxygen exposures, the thickness of the oxide layers was determined by angle resolved AES, XPS results, and by sputter depth profiling which also gives the elemental in depth distribution. It is concluded that the initial preferential oxidation of Cr is followed by a surface enrichment and oxidation of the remaining elements with lower affinity to oxygen, i.e. Ni in NiCr and both Ni and Fe in NiCrFe.
    Additional Material: 14 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740111207
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    Paper (German National Licenses)
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  • 7
    Electronic Resource
    Electronic Resource
    Redeposition in AES sputter depth profiling of multilayer Cr/Ni thin films (1988)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 12 (1988), S. 83-86 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: During sputter depth profiling, a part of the sputtered matter is redeposited on the sample surface. In particular for rough surfaces, redeposition is expected to have a strong influence on the accuracy of the indepth analysis and on the depth resolution. To study these effects, simple model arrangements were utilized to simulate rought surfaces, which consisted of two differently inclined, adjacent planes of multilayer Cr/Ni thin films with smooth surfaces, inclined at two different angles. Depth profiling was performed by two-point AES analysis, simultaneously on both planes, during sputtering with a rastered beam of 3 keV Ar+ ions at incidence angles of 33°, 61° and 76°. The results show that the influence of redeposition on the depth resolution of AES sputter profiles depends on the geometric position of the neighbouring planes and on the ion incidence angle.
    Additional Material: 7 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740120204
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  • 8
    Electronic Resource
    Electronic Resource
    Reply to: On the features associated with M23VV Auger transitions of Cr and Fe: A comment by C. Palacio on the paper by J. Steffen and S. Hofmann ‘oxidation of NiCr and NiCrFe alloys at room temperature’1 (1989)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 14 (1989), S. 160-160 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740140311
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  • 9
    Electronic Resource
    Electronic Resource
    Reduction of charging in surface analysis of insulating materials by AES (1989)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 14 (1989), S. 250-256 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Practical methods are investigated to reduce the charging which is often observed during AES analysis of insulating samples with keV electrons. It is shown that the negative charge caused by electron beams with keV energy can be either avoided or considerably reduced by the use of an additional electron beam or by the supply of low-energy (500 eV) positive ions. It is also reported and discussed that the state of reduced or vanishing charging obtained by both methods can be maintained for long periods of time.
    Additional Material: 7 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740140507
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    Paper (German National Licenses)
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