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  • 1985-1989  (3)
Material
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Year
  • 1
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 54 (1989), S. 1878-1880 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The unstrained valence-band offset ΔEv for the x=0 and x=1 end points of the InxGa1−xAs/InP (100) heterojunction system has been measured by x-ray photoemission spectroscopy (XPS). Although the GaAs/InP and InAs/InP interfaces are strained because of lattice mismatch, the ΔEv values obtained by the XPS measurement method used are characteristic of an unstrained interface. Values of ΔEv (GaAs/InP)=0.19 eV and ΔEv (InAs/InP)=0.31 eV are observed. A linear interpolation between the x=0 and x=1 values gives ΔEv (In0.53 Ga0.47As/ InP)=0.25 eV for the x=0.53 lattice-matched interface (ΔEc /ΔEv =58/42).
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 52 (1988), S. 1794-1796 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Metal Schottky barrier contacts to n-type (100) GaAs are described in which a 1 eV Schottky barrier height φB is achieved by using a very thin Si interface layer to influence the interface Fermi energy EiF. The metals investigated are Au, Cr, and Ti. The contact structure consists of a thick metal in combination with a ∼15–30 A(ring) heavily p-type Si interface layer. The EiF and interface composition during initial contact formation were obtained by x-ray photoemission spectroscopy (XPS); the φB for the corresponding thick contacts was measured by current-voltage (I-V) and capacitance-voltage (C-V) techniques. The XPS, I-V, and C-V measurements gave consistent results. The 1 eV φB for the Si interface layer contact structure is independent of the contact metal.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 53 (1988), S. 1518-1520 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Metal Schottky barrier contacts to p-type (100) GaAs are described in which a large Schottky barrier height φB is attained by using a very thin Si or Ge interface layer to influence the interface Fermi energy EiF. The metals investigated are Au, Cr, Mn, Ni, and Al. Au, Cr, and Mn contacts have φB values from 0.7 to 0.9 eV when ∼15 A(ring) Si and Ge interlayers are made heavily n type. Ni and Al contact φB values were limited to 0.6–0.7 eV. X-ray photoemission spectroscopy was used to obtain the EiF and interface composition during contact formation; the φB for the corresponding thick contacts was measured by current-voltage and capacitance-voltage methods.
    Type of Medium: Electronic Resource
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