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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 65 (1989), S. 619-623 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Titanium dioxide films of 100–450-nm thickness were deposited on fused quartz and silicon substrates heated at 350 °C by a reactive-ionized cluster-beam deposition. After the deposition, films were annealed at 600 °C in dry O2 ambient. The electrical properties of TiO2 films and the TiO2-Si interface were analyzed. The dielectric constant of the film after the annealing was in a range of 35–108, which depended on the deposition conditions. The films showed a high breakdown voltage and a sufficiently low interface-state density of 1–2×1011 cm−2 eV−1 at the midgap.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 63 (1988), S. 241-244 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Al2O3 films about 1000 A(ring) thick were deposited on polished Si(100) substrates by the reactive ionized cluster beam method. It was found that the index of refraction, the etch rate in HF, and the microstructure of the films could be controlled by varying substrate temperatures up to 600 °C and acceleration voltages between 0.25 and 3 kV.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 58 (1985), S. 4146-4149 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Titanium oxides films of 150–400 nm thickness were deposited on glass and Si substrates by reactive ionized cluster beam deposition. Characteristics of films deposited at different deposition conditions of oxygen partial pressure, ionization current, and acceleration voltage have been examined. The films prepared at an oxygen pressure of 1–2×10−4 Torr showed stoichiometry of TiO2. The film is a mixture of anatase and rutile structures. By increasing the ionization current from 0 to 400 mA, the refractive index of the film could be increased from 2.0 to 2.6. By deposition at a high ionization current, the film showed rutile structure, whereas the anatase structure could be formed at a low ionization current. The optical absorption of the films is low when the films are deposited at a higher acceleration voltage.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 54 (1989), S. 18-20 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Electromigration experiments have been carried out on aluminum thin films which have been deposited on oxide-free (111) silicon by employing the "ionized cluster beam'' technique as well as other related deposition methods. It has been found that the same high electromigration resistance and film structure is obtained with or without utilizing a nozzled crucible and with or without applying ionization and acceleration voltages during deposition. The conclusions are supported by electromigration lifetime measurements, scanning electron micrographs, optical micrographs, reflective high-energy electron diffraction, and x-ray diffraction.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 53 (1988), S. 1765-1767 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Unpassivated, pure aluminum films on 7000-A(ring)-thick SiO2 were prepared by ionized cluster beam deposition in a vacuum of 2×10−6 Torr from a carbon crucible which had a nozzle of 2 mm diameter. The resulting particle beam was ionized by impact of electrons and accelerated by an electrical potential towards the substrate. The activation energy for electromigration for these films at temperatures between 125 and 200 °C was found to be 1.1 eV. The initial resistivity of the films was about 12 μΩ cm which decreased to 8 μΩ cm due to annealing at temperatures between 400 and 450 °C.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    Springer
    Neuroradiology 31 (1989), S. 372-372 
    ISSN: 1432-1920
    Source: Springer Online Journal Archives 1860-2000
    Topics: Medicine
    Type of Medium: Electronic Resource
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  • 7
    ISSN: 1432-0533
    Keywords: Demyelination ; Myelinolysis ; Central pontine myelinolysis ; Pontine and extrapontine myelinolysis
    Source: Springer Online Journal Archives 1860-2000
    Topics: Medicine
    Notes: Summary Three autopsy cases of pontine and extrapontine myelinolysis are reported; one, a malignant lymphoma in a man of 66 years, the other an alcoholic liver cirrhosis in a man of 54 years, and an esophageal cancer in a woman of 68 years who presented only with extrapontine myelinolysis, but lacked central pontine myelinolysis (CPM). The extrapontine lesions in these three cases revealed a characteristic and common localization; they occurred mostly (1) in the bundles of myelinated fibers in the gray matter, such as in the pons, basal ganglia, and thalamus; and (2) in the white matter surrounded by massive gray matter, such as the deeper layers of the cortex and subjacent white matter of the crowns and sides of the cerebral gyri, the white matter of the cerebellar folia and internal, external, and extreme capsules. Therefore, the third patient was classified as a subtype of pontine and extrapontine myelinolysis, which may be called the “extrapontine form” because of absence of CPM. Moreover, bilateral demyelination of the mamillary body was found in all cases, and laminar cortical astrocytosis and necrosis similar to Morel's cortical laminar sclerosis in two of them. From the clinical and pathologic findings, the significance of the changed osmolarity of the blood as a cause and the importance of some specificity of the tissue architecture in the pathogenesis are discussed.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Springer
    The European physical journal 3 (1986), S. 137-142 
    ISSN: 1434-6079
    Keywords: 36.40 ; 47.55E ; 68.55.tb
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract The formation and kinetics of large vapourized-material cluster beams (large size metal clusters) are discussed. The clusters are formed by injecting the vapour of solid state materials into a high vacuum region through a nozzle of a heated crucible. The conditions under which metal clusters form are analysed using nucleation theory. Computer simulation by combining the nucleation and flow equations has also been made. The results show that the theory can be useful in predicting qualitative dependences of metal cluster formation on operation conditions. Several experimental results are also presented, which support the finding that a large size metal cluster is formed by homogeneous nucleation and growth. The advantageous characteristics of ionized cluster beam for thin film formation are also discussed.
    Type of Medium: Electronic Resource
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