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Micro-Raman study of ion-irradiated oxidized silicon surfaces (1993)

Tripathi, R. ; Kar, S. ; Bist, H. D.

Chichester [u.a.] : Wiley-Blackwell

Journal of Raman Spectroscopy 24 (1993), S. 641-644

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Details

ISSN: 0377-0486

Keywords: Chemistry ; Analytical Chemistry and Spectroscopy

Source: Wiley InterScience Backfile Collection 1832-2000

Topics: Chemistry and Pharmacology , Physics

Notes: Micro-Raman studies were performed on ion-irradiated oxidized silicon surfaces with different ion energies, ion fluences and subsequent hydrogenation to determine the efficacy and sensitivity for obtaining information on the degree of ion beam-induced damage in very thin (ca. 100 Å) layers of silicon subsurface and the top oxide. The variations in the Raman spectra were interpreted in terms of the degree of amorphization produced in the silicon sub-surface by the ion beam and depolymerization of the top SiO2 layer.

Additional Material: 2 Ill.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1002/jrs.1250241002

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