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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 60 (1995), S. 187-191 
    ISSN: 1432-0649
    Keywords: 42.50.Dv ; 03.75.Dg ; 03.75.Fi
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract The standard quantum limit is calculated for the atom-light interferometer. It is shown that the smallest detectable phase is $$\delta \phi _{\min } = \frac{1}{2}[N_{atoms} + 4N_{photons} )/N_{atoms} N_{photons} ]^{1/2} .$$ Therefore, in practical experiments, the accuracy is limited by the square root of the number of atoms. We propose a novel correlated atom-photon state interferometer which makes a transition to the Heisenberg limit, δφmin ∝ 1/N atoms, as the atoms approach a Bose condensate. Such an interferometer may serve as a sensitive probe of the onset of Bose condensation. Finally, we point out that the correlated atom-photon state preparation scheme we propose may be used in a different way to approach the Heisenberg limit for non-Bose-condensed atoms.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1573-5036
    Keywords: Al stress ; Ca2+ ; H+ pump ; K+ efflux ; low pH
    Source: Springer Online Journal Archives 1860-2000
    Topics: Agriculture, Forestry, Horticulture, Fishery, Domestic Science, Nutrition
    Notes: Abstract H+-ATPase activity of a plasma membrane-enriched fraction decreased after the treatment of barley (Hordeum vulgare) seedlings with Al for 5 days. A remarkably high level of Al was found in the membrane fraction of Al-treated roots. A long-term effect of Al was identified as the repression of the H+-ATPase of plasma membranes isolated from the roots of barley and wheat (Triticum aestivum) cultivars, Atlas 66 (Al-tolerant) and Scout 66 (Al-sensitive). To monitor short-term effects of Al, the electrical membrane potentials across plasma membranes of both wheat cultivars were compared indirectly by measuring the efflux of K+ for 40 min under various conditions. The rate of efflux of K+ in Scout was twice that in Atlas at low pH values such as 4.2. Vanadate, an inhibitor of the H+-ATPase of the plasma membrane, increased the efflux of K+. Al repressed this efflux at low pH, probably through an effect on K+ channels, and repression was more pronounced in Scout. Al strongly repressed the efflux of K+ irrespective of the presence of vanadate. Ca2+ also had a repressive effect on the efflux of K+ at low pH. The effect of Ca2+, greater in Scout, might be related to the regulation of the net influx of H+, since the effect was negated by vanadate. The results suggest that extracellular low pH may cause an increase in the influx of H+, which in turn is counteracted by the efflux of K+ and H+. These results suggest that the ability to maintain the integrity of the plasma membrane and the ability to recover the electrical balance at the plasma membrane through a net influx of H+ and the efflux of K+ seem to participate in the mechanism of tolerance to Al stress under acidic conditions.
    Type of Medium: Electronic Resource
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