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  • 1980-1984  (3)
  • Chemical Engineering  (2)
  • Pisum  (1)
  • 1
    Electronic Resource
    Electronic Resource
    Stomatal responses of Argenteum — a mutant of Pisum sativum L. with readily detachable leaf epidermis (1982)
    Springer
    Planta 155 (1982), S. 146-153 
    Details
    ISSN: 1432-2048
    Keywords: Abscisic acid ; Cytokinin ; Mutant (barley) ; Pisum ; Potassium and stomata protoplast ; Stomata (epidermis)
    Source: Springer Online Journal Archives 1860-2000
    Topics: Biology
    Notes: Abstract Epidermis is easily detached from both adaxial and abaxial surfaces of leaf four of the Argenteum mutant of Pisum sativum L. The isolated epidermis has stomata with large, easily-measured pores. Hairs and glands are absent. The density of stomata is high and contamination by mesophyll cells is low. In the light and in CO2-free air, stomata in isolated adaxial epidermis of Argenteum mutant opened maximally after 4 h incubation at 25°C. The response of stomata to light was dependent on the concentration of KCl in the incubation medium and was maximal at 50 mol m-3 KCl. Stomata did not respond to exogenous kinetin, but apertures were reduced by incubation of epidermis on solutions containing between 10-5 and 10-1 mol m-3 abscisic acid (ABA). The responses of stomata of Argenteum mutant to light, exogenous KCl, ABA and kinetin were comparable with those described previously for stomata in isolated epidermis of Commelina communis. A method for preparing viable protoplasts of guard cells from isolated epidermis of Argenteum mutant is described. The response of guard cell protoplasts to light, exogenous KCl, ABA and kinetin were similar to those of stomata in isolated epidermis except that the increase in volume of the protoplasts in response to light was maximal at a lower concentration of KCl (10 mol m-3) and that protoplasts responded more rapidly to light than stomata in isolated epidermis. The protoplasts did not respond to exogenous kinetin, but when incubated for 1 h in the light and in CO2-free air on a solution containing 10-3 mol m-3 ABA, they decreased in volume by 30%. The advantages of using epidermis from Argenteum mutant for experiments on stomatal movements are discussed.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00392545
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    Paper (German National Licenses)
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  • 2
    Electronic Resource
    Electronic Resource
    Poly(4-chlorostyrene), a new high contrast negative E-beam resist (1983)
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 23 (1983), S. 1047-1049 
    Details
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: PCS(poly-4-chlorostyrene) has previously been evaluated as a negative e-beam resist, but although the sensitivity was good [2 to 5μC/square centimeter (cm2)], the contrast (γ) was poor (1.1 to 1.5). Recent experiments have shown that contrast is not only a function of molecular weight distribution (MWD), but can also be affected by polymerization conditios. Among these are: branching, head to head linkages, and oxygen in backbone. PCS was prepared via thermal free radical solution polymerization, and then fractionated by differential solvation techniques. Reactions occurring during polymerization and crosslink formation on irradiation will be discussed. For molecular weights of 700 and 300K respectively (same MWD), the sensitivity was 2 and 5μC/cm2, while the contrast (γ) was 3.5 for both. This is the highest reported contrast for a polymeric negative resist. The resist can then be UV hardened after development, and will not flow at 200°C. The RIE etch rate is ∼1/2 that of PMMA in various plasmas.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pen.760231814
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  • 3
    Electronic Resource
    Electronic Resource
    Organosilicon polymers for lithographic applications (1983)
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 23 (1983), S. 1054-1058 
    Details
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Linear polymers of silicone gums (polysiloxanes) have many attributes that make them attractive for lithographic applications, such as oxidative and thermal stability, good adhesion properties, solubility in common solvents, and resistance to etching in an oxygen plasma. When polysiloxanes are used as the top imaging layer (∼2000Å) in a two-layer resist system, the developed negative siloxane images act as a high resolution etch mask for the oxygen plasma etching of the bottom planarizing polymer layer. Commercially available polysiloxanes have been evaluated for their deep UV sensitivity at 2537Å, and have been found to have very high resolution capabilities (∼0.5μ) and high contrast (γ = 4). The negative images do not swell in the developer, and the line width is therefore independent of development time. The combination of high resolution, sensitivity, and ease of processing make this a simple multilayer system for deep UV and e-beam applications.
    Additional Material: 11 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pen.760231816
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    Paper (German National Licenses)
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