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  • 1980-1984  (3)
  • Chemical Engineering  (2)
  • withdrawal hypersensitivity  (1)
  • 1
    Electronic Resource
    Electronic Resource
    The phenomenon of β-adrenergic hypersensitivity following propranolol withdrawal studied in normal subjects (1984)
    Springer
    European journal of clinical pharmacology 27 (1984), S. 423-428 
    Details
    ISSN: 1432-1041
    Keywords: propranolol ; beta-adrenoceptor blockade ; withdrawal hypersensitivity ; normal subjects
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Medicine
    Notes: Summary A study was carried out to determine whether beta-adrenergic hypersensitivity occurs in normal subjects following the abrupt withdrawal of the beta-adrenoceptor antagonist propranolol. Sixteen normal subjects took propranolol, orally, 120 mg twice daily for one week. Heart rate and blood pressure were measured supine and standing as well as during exercise. Heart rate was measured during and following the Valsalva manoeuvre. Measurements were made on the last day of the treatment period and on two occasions during the six days following withdrawal. Three subjects were removed from the analysis because of failure to take medication and one more was excluded because of protocol variation. In the remaining twelve, propranolol treatment reduced all parameters measured. Following abrupt withdrawal of the drug, there was no measurable increase in any of the parameters above baseline or placebo values within six days of the withdrawal. These findings, from normal subjects, do not support the phenomenon of beta-adrenergic hypersensitivity following propranolol withdrawal.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00549589
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    Paper (German National Licenses)
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  • 2
    Electronic Resource
    Electronic Resource
    Poly(4-chlorostyrene), a new high contrast negative E-beam resist (1983)
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 23 (1983), S. 1047-1049 
    Details
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: PCS(poly-4-chlorostyrene) has previously been evaluated as a negative e-beam resist, but although the sensitivity was good [2 to 5μC/square centimeter (cm2)], the contrast (γ) was poor (1.1 to 1.5). Recent experiments have shown that contrast is not only a function of molecular weight distribution (MWD), but can also be affected by polymerization conditios. Among these are: branching, head to head linkages, and oxygen in backbone. PCS was prepared via thermal free radical solution polymerization, and then fractionated by differential solvation techniques. Reactions occurring during polymerization and crosslink formation on irradiation will be discussed. For molecular weights of 700 and 300K respectively (same MWD), the sensitivity was 2 and 5μC/cm2, while the contrast (γ) was 3.5 for both. This is the highest reported contrast for a polymeric negative resist. The resist can then be UV hardened after development, and will not flow at 200°C. The RIE etch rate is ∼1/2 that of PMMA in various plasmas.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pen.760231814
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    Paper (German National Licenses)
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  • 3
    Electronic Resource
    Electronic Resource
    Organosilicon polymers for lithographic applications (1983)
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 23 (1983), S. 1054-1058 
    Details
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Linear polymers of silicone gums (polysiloxanes) have many attributes that make them attractive for lithographic applications, such as oxidative and thermal stability, good adhesion properties, solubility in common solvents, and resistance to etching in an oxygen plasma. When polysiloxanes are used as the top imaging layer (∼2000Å) in a two-layer resist system, the developed negative siloxane images act as a high resolution etch mask for the oxygen plasma etching of the bottom planarizing polymer layer. Commercially available polysiloxanes have been evaluated for their deep UV sensitivity at 2537Å, and have been found to have very high resolution capabilities (∼0.5μ) and high contrast (γ = 4). The negative images do not swell in the developer, and the line width is therefore independent of development time. The combination of high resolution, sensitivity, and ease of processing make this a simple multilayer system for deep UV and e-beam applications.
    Additional Material: 11 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pen.760231816
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    Paper (German National Licenses)
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