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Fetal bile acids in congenital biliary atresia —production in the liver and clinical significance (1991)

Hata, Y. ; Uchino, J. ; Sasaki, F. ; [et al.]

Springer

Pediatric surgery international 6 (1991), S. 309-312

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ISSN: 1437-9813

Keywords: Congenital biliary atresia ; 1β-hydroxy bile acids ; Fetal bile acids

Source: Springer Online Journal Archives 1860-2000

Topics: Medicine

Notes: Abstract The 1β-hydroxy bile acids have been said to be fetal bile acids. These bile acids were evaluated in eight patients with congenital biliary atresia (CBA) using gas chromatography-mass spectrometry. At the time of operation 1β,3α,7α,12α-tetrahydroxy-5β-cholan-24-oic acid (CA-1β-ol) and 1β,3α,7α-trihydroxy-5β-cholan-24-oic acid (CDCA-1β-ol) were 0.46 ± 34 μg/ml and 0.72 ± 0.45 μg/ml, respectively, which was significantly higher than in the control group. The percentage CA-1β-ol of total bile acids showed a tendency to decrease as age advanced. The grade of hepatic fibrosis ranged from F2 to F3 and the values and percentages of CA-1β-ol and CDCA-1β-ol were relatively higher in F2 than F3 patients. The percentage of total bile acids gradually increased in patients without sufficient bile flow but fell sharply after Kasai's procedure in the patients with sufficient bile flow. It appears that fetal bile acids are produced in the livers of CBA patients in the same way as in fetal liver, and that production continues in patients without good bile secretion even after Kasai's procedure. These results suggest that these hydroxylases are reactivated in CBA patients.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1007/BF00178645

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Al-Cu-Si/TiW interface reaction due to thermal treatments (1992)

Misawa, Y. ; Koike, Y.

Chichester [u.a.] : Wiley-Blackwell

Surface and Interface Analysis 19 (1992), S. 347-352

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ISSN: 0142-2421

Keywords: Chemistry ; Polymer and Materials Science

Source: Wiley InterScience Backfile Collection 1832-2000

Topics: Physics

Notes: The Al-0.5 wt.% Cu-1 wt.% Si/TiW interface reaction due to thermal treatments in nitrogen was investigated using SIMS, x-ray diffraction (XRD), TEM, XPS and SEM. Titanium starts to diffuse into the Al alloy layer at low temperatures such as 350°C. However, Ti has hardly any effect on the sheet resistance. Tungsten diffuses and reacts with Al above 450°C. The rugged interfacial reaction product formed after annealing at 450°C, which may be W(Al, Si)2, does not affect the sheet resistance. The needle-shaped reaction product formed after annealing above 500°C, which is Al12 W, is responsible for the large increase in sheet resistance. An aluminium oxide layer, several nanometres thick, formed on the Al alloy surface after annealing at 500°C acts as a W diffusion barrier.

Additional Material: 8 Ill.