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  • Artikel: DFG Deutsche Nationallizenzen  (2)
  • Polymer and Materials Science  (2)
Datenquelle
  • Artikel: DFG Deutsche Nationallizenzen  (2)
Materialart
Erscheinungszeitraum
  • 1
    Digitale Medien
    Digitale Medien
    New York, NY [u.a.] : Wiley-Blackwell
    Journal of Applied Polymer Science 47 (1993), S. 487-498 
    ISSN: 0021-8995
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Chemie und Pharmazie , Maschinenbau , Physik
    Notizen: Dilute polyolefin solutions, respectively based on EPDM and UHMWPE, were reacted with functionalized silanes to prepare coatings for glass fibers. These were found to provide adequate bonding characteristics for both glass and epoxy resin (bisphenol type). Unidirectional composites containing fiber matrix interlayers, using fibers coated with the aforementioned functionalized polyolefins, were found to exhibit much larger tanδ values over the temperature range of 60 to +60°C and greater ductility in flexural tests, albeit at the expense of a reduction in failure stresses. The UHMWPE coatings produced a multiple step fracture mechanism, which was deemed to provide a more efficient crack stopping mechanism than equivalent EPDM coated fibers. © 1993 John Wiley & Sons, Inc.
    Zusätzliches Material: 14 Ill.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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  • 2
    Digitale Medien
    Digitale Medien
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 14 (1989), S. 7-12 
    ISSN: 0142-2421
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Physik
    Notizen: The Interfacial reactions between Al and RuO2, MoOx and WNx diffusion barriers on Si (100) wafers have been studied. The diffusion barrier structures were analyzed before and after various heat treatments using Auger electron spectroscopy (AES) and cross-sectional transmission electron microscopy (XTEM). Al was found to reduce the oxides of both Ru and Mo. A 100 Å thick Al2O3 layer developed between the Al and the RuO2 films during annealing at 500°C for 30 minutes. The formation of interfacial Al2O3 efficiently prevents Al penetration but may cause a too high contact resistance for applications in contact structures of microelectronic devices. The WNx barrier was stable after annealing at 600°C for 30 minutes, if the film was exposed to air prior to Al deposition. If, instead, the Al was deposited in situ, the structure failed after annealing at 500°C due to a reaction between Al and W giving WAl12. A thin Al2O3 layer was detected between the Al and the WNx films of the air exposed sample. This layer had the effect of retarding the Al-W reaction and thereby raised the failure temperature of the barrier by at least 100°C.
    Zusätzliches Material: 6 Ill.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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