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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 8 (1988), S. 263-280 
    ISSN: 1572-8986
    Keywords: Microwave plasma ; gas-phase reactions ; mass spectrometer sampling ; discharge chemistry of SF6 with O2
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Processes which occur in microwave discharges of dilute mixtures of SF6 and O2 in He have been examined using a flow reactor sampled by a mass spectrometer. Two classes of experiments were performed. In the first set of experiments, mixtures containing 6×1011 cm−3 SF6, 6×1016 cm−3 He, and O2 in the range (0–3.6)×1013 cm−3 were passed through a 20-W 2450-MHz microwave discharge. The gas mixtures arriving at a sample point downstream from the discharge were examined for SF6, SF4, SOF2, SOF4, SO2F2, SO2, F, and O. In the second class of experiments, rate coefficients were measured for the reactions of SF4 with O and O2 and for the reaction of SF with O. The rate coefficient for the reaction of SF with O was found to be (4.2±1.5)×10−11 cm−3 s−1. SF4 was found to react so slowly with both oxygen atoms and oxygen molecules that only upper limits could be placed on the rate coefficients for these reactions. These values were 2×10−14 cm3 s−1 and 5×10−15 cm3 s−1 for reactions with O and O2 respectively. The observed distribution of products from the discharged mixtures is discussed in terms of the measured rate coefficients.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 6 (1986), S. 205-230 
    ISSN: 1572-8986
    Keywords: Plasma etching ; gas-phase reactions ; modelling
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A model has been developed in an attempt to explain the chemistry which occurs in plasmas produced in mixtures of CF4 and O2. Emphasis is placed on gas-phase free radical reactions, and the predictions of the model are compared with experimental results. Dissociation rates following electron impact are deduced mainly from experimental observations although relative dissociation rates have been calculated. An important assumption of the model is that CF2 can be produced as a primary dissociation product following electron impact. Furthermore, this process is favored over that producing CF3 by more than a factor of 2. Experimental evidence is presented to support this assumption. Although the model agrees well with experiment on the total amount of fluorine produced, some discrepancy exists between the predicted and measured values of [F2]. It is suggested that the higher concentrations detected in the experiments resulted from recombination of F atoms in the sampling region. The agreement for concentrations of CO2, CO, and COF2 is generally better than a factor of 2 over a wide range of experimental conditions.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 10 (1990), S. 207-229 
    ISSN: 1572-8986
    Keywords: Plasma etching ; modeling ; SF6 ; O2 ; gas-phase reactions
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A model has been developed to describe the chemistry which occurs in SF6/O2 plasmas and the etching of silicon in these plasmas. Emphasis is placed nn the gas-phase free radical reactions, and the predictions n( the model are compared with experimental results. Forty-seven reactions are included, although a subset of 18 reactions describes the chemistry equally well. Agreement between the calculated and measured concentrations of stable products downstream of the plasma is better than a factor of 2. The need for additional kinetic data and fàr well-characterized diagnostic studies of SF6/O2 plasmas is discussed.
    Type of Medium: Electronic Resource
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