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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 3 (1983), S. 259-273 
    ISSN: 1572-8986
    Keywords: Electric arcs ; thermal plasmas ; contaminants ; modeling
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Plasmas consisting of a high-ionization-potential component mixed with a low-ionization-potential contaminant are common in industrial processes. Modeling results are presented for a sodium-contaminated nitrogen plasma column operating either in a free-burning (low-temperature) mode or operating in a constricted (high-temperature) mode. At sufficiently high plasma temperatures, the behavior is dominated by the high-ionization-potential component's properties. The low-ionization-potential contaminant's properties determine the low-temperature plasma behavior even when the contaminant is present in relatively small quantities.
    Type of Medium: Electronic Resource
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