Bibliothek

feed icon rss

Ihre E-Mail wurde erfolgreich gesendet. Bitte prüfen Sie Ihren Maileingang.

Leider ist ein Fehler beim E-Mail-Versand aufgetreten. Bitte versuchen Sie es erneut.

Vorgang fortführen?

Exportieren
  • 1
    ISSN: 1432-0630
    Schlagwort(e): 42.60 ; 78.90
    Quelle: Springer Online Journal Archives 1860-2000
    Thema: Maschinenbau , Physik
    Notizen: Abstract The time course of laser light induced transport of tungsten films from a glass support is followed by ultrafast photography using delayed dye laser pulses. The photographs provide unambiguous evidence that the material transport in the 40–200 mJ/cm2 intensity domain takes place via removal of solid pieces from the film material. These results are consistent with heat flow calculations which predict the overall melting of the metal layer above 380 mJ/cm2. The series of photographs presented give detailed insight into the melting process and have revealed an unexpected in-flight phase separation of solid fracture pieces and molten droplets throughout the 200–900 mJ/cm2 domain. The faster propagating molten droplets form a condensed halo in front of the solid pieces, thereby providing an efficient shield between the processing laser light and the solid phase.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 2
    Digitale Medien
    Digitale Medien
    Springer
    Applied physics 54 (1992), S. 170-175 
    ISSN: 1432-0630
    Schlagwort(e): 42.60K ; 78.90 ; 81.15 ; 81.30
    Quelle: Springer Online Journal Archives 1860-2000
    Thema: Maschinenbau , Physik
    Notizen: Abstract A comparative study on metal pattern deposition of mm2-area by ablating chromium and titanium thin films from an optically transparent support and transferring the ablated material onto another substrate in close proximity with a single laser pulse (LIFT) is reported. The role of support-film interface and film-to-substrate distance in determining both ablation and transfer is discussed. The sequence of events as a function of processing fluence is interpreted by comparing experimental data with calculated temperature distributions. In the case of poorly adhering films the transfer yield is independent of film-to-substrate distance between 0 and 60 μm throughout the fluence range studied. The transmittance of the ablated areas of well adhering films decreases and that of the corresponding prints increases with increasing distance as evaporation becomes dominant.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
Schließen ⊗
Diese Webseite nutzt Cookies und das Analyse-Tool Matomo. Weitere Informationen finden Sie hier...