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A two magnetron sputter deposition chamber for in situ observation of thin film growth by synchrotron radiation scattering (2001)

Matz, W. ; Schell, N. ; Neumann, W.

[S.l.] : American Institute of Physics (AIP)

Review of Scientific Instruments 72 (2001), S. 3344-3348

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Details

ISSN: 1089-7623

Quelle: AIP Digital Archive

Thema: Physik , Elektrotechnik, Elektronik, Nachrichtentechnik

Notizen: The design of a sputter deposition chamber for the in situ study of film growth by synchrotron x-ray diffraction and reflectivity is reported. Four x-ray windows, sealed with low cost, nonhazardous Kapton, enable scattering both in the horizontal as well as in the vertical scattering planes. The chamber fits into a standard six-circle goniometer from Huber which is relatively widespread in synchrotron laboratories. Two miniature magnetron and additional gas inlets allow for the deposition of compound films or multilayers. Substrate heating up to 650 °C and different substrate bias voltage are possible. The performance of the chamber was tested with the deposition of high quality TiN films of different thicknesses. © 2001 American Institute of Physics.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1063/1.1384432

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