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  • 1965-1969  (13)
  • 11
    Electronic Resource
    Electronic Resource
    New York, NY [u.a.] : Wiley-Blackwell
    Journal of Applied Polymer Science 11 (1967), S. 2373-2379 
    ISSN: 0021-8995
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Poly(methyl methacrylate) has been photolyzed with 2537 A. radiation in dioxane and in methylene chloride at about 25°C. in the presence and absence of air. In degassed solutions, quantum yields for random scission are only slightly affected by either intensity or polymer concentration. Oxygen is an apparent inhibitor for photodegradation. The inhibiting and sensitizing effects of a variety of added solutes, including aromatic hydrocarbons, aliphatic dienes, and ketones were investigated; the behavior is similar whether or not oxygen is present. The results are best explained on the basis of an electronic energy transfer mechanism involving the lowest excited triplet levels of the polymer and the added solutes.
    Additional Material: 2 Tab.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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  • 12
    Electronic Resource
    Electronic Resource
    New York : Wiley-Blackwell
    Journal of Polymer Science Part A: General Papers 3 (1965), S. 2303-2311 
    ISSN: 0449-2951
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Notes: Apparent quantum yields for the random scission of poly(α-methylstyrene) in solution by 2537 A. radiation were shown to be solvent-dependent, indicating that processes other than the direct photolysis of the polymer are taking place. Quantum yields on the order of 10-3 scissions per quantum absorbed by the polymer were found in benzene, dioxane, cyclohexane, and methylene chloride and about 0.2 in chloroform and carbon tetrachloride; the quantum yields were unaffected by oxygen. In carbon tetrachloride, the quantum yields decreased slightly with increasing polymer concentration. Ethanol and cyclohexane were inhibitors for the photolysis in carbon tetrachloride, while the latter solvent acted as a sensitizer in cyclohexane. By comparison with model compounds irradiated in carbon tetrachloride, it was shown that an early step in the photolysis of poly(α-methylstyrene) in this solvent involves reaction with a main-chain methylene group and eventual substitution with a trichloromethyl group.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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  • 13
    Electronic Resource
    Electronic Resource
    New York : Wiley-Blackwell
    Journal of Polymer Science Part B: Polymer Letters 4 (1966), S. 771-774 
    ISSN: 0449-2986
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Additional Material: 1 Ill.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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