Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
59 (1991), S. 3616-3618
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Raman scattering has been combined with in situ sputtering for a depth resolved Raman spectroscopic characterization of semiconductor structures. Using optical excitation in resonance with higher lying band gaps, such as the E1 band gap of GaAs, a depth resolution of a few nm can be achieved along with an enhanced sensitivity due to resonance effects in the scattering efficiency. The present experimental technique is demonstrated by recording a composition profile from a GaAs/AlxGa1−xAs multiple quantum well structure. Furthermore, the ability of lattice site selective depth profiling of dopant distributions is shown for Si incorporated on Ga and As lattice sites, respectively, in Si+ implanted and annealed GaAs.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.105624
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