ISSN:
0167-9317
Schlagwort(e):
0.1 μm
;
Electron beam lithography
;
HPA (hetero polytungstic acid)
;
Stress
;
X-ray diffraction
;
XPS
;
conductivity
;
direct delineation
;
fine metallic patterns
;
hydrogen reduction
;
inorganic resist
;
tungsten
Quelle:
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
Thema:
Elektrotechnik, Elektronik, Nachrichtentechnik
Materialart:
Digitale Medien
URL:
http://linkinghub.elsevier.com/retrieve/pii/0167-9317(91)90001-T
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