Bibliothek

Sie haben 0 gespeicherte Treffer.
Markieren Sie die Treffer und klicken Sie auf "Zur Merkliste hinzufügen", um sie in dieser Liste zu speichern.
feed icon rss

Ihre E-Mail wurde erfolgreich gesendet. Bitte prüfen Sie Ihren Maileingang.

Leider ist ein Fehler beim E-Mail-Versand aufgetreten. Bitte versuchen Sie es erneut.

Vorgang fortführen?

Exportieren
  • 1
    Digitale Medien
    Digitale Medien
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 91 (1989), S. 6822-6829 
    ISSN: 1089-7690
    Quelle: AIP Digital Archive
    Thema: Physik , Chemie und Pharmazie
    Notizen: The mechanism of the radiative species Si*(1P0) formation from SiH4 was investigated with ab initio molecular orbital–configuration interaction calculations on two reaction routes: (a) the simplest one-step reaction mechanism SiH4→Si+2H2 and (b) the second simplest two-step reaction mechanism SiH4→SiH2+H2→Si+2H2. The conclusions obtained are as follows: (i) the one-step mechanism (a) operates effectively in the generation of the radiative species Si*(1P0), (ii) no effective path was found for the formation of Si*(1P0) in the two-step mechanism, (iii) the radiative species Si*(1P0) originates from the fifth lowest excited singlet state 11T1 of SiH4 at the Td structure in the one-step mechanism (a), whereas the nonradiative species Si(1D) is produced spontaneously from the fourth lowest excited singlet state 11E in both reaction mechanisms of (a) and (b), (iv) the nonradiative species SiH2(11B1) is spontaneously generated from the lowest excited singlet state 11T2 of SiH4, (v) the electronic state of the radiative Si*(1P0) has Rydberg character and the emission of Si*(1P0) at 288.2 nm is approximately expressed by 3p4s(1P0)→3p2(1D) where 4s is a Rydberg atomic orbital (AO). It was also concluded that the contributions of 3d AOs are important for making a description of the quantitative energy separations among the lower lying singlet states, 1D, 1S, and 1P0 of Si atoms.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 2
    Digitale Medien
    Digitale Medien
    s.l. : American Chemical Society
    Journal of the American Chemical Society 106 (1984), S. 6751-6755 
    ISSN: 1520-5126
    Quelle: ACS Legacy Archives
    Thema: Chemie und Pharmazie
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 3
    Digitale Medien
    Digitale Medien
    s.l. : American Chemical Society
    Journal of the American Chemical Society 108 (1986), S. 5780-5783 
    ISSN: 1520-5126
    Quelle: ACS Legacy Archives
    Thema: Chemie und Pharmazie
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 4
    Digitale Medien
    Digitale Medien
    s.l. : American Chemical Society
    Journal of the American Chemical Society 107 (1985), S. 1940-1946 
    ISSN: 1520-5126
    Quelle: ACS Legacy Archives
    Thema: Chemie und Pharmazie
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 5
    Digitale Medien
    Digitale Medien
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 85 (1986), S. 2808-2813 
    ISSN: 1089-7690
    Quelle: AIP Digital Archive
    Thema: Physik , Chemie und Pharmazie
    Notizen: Ab initio molecular orbital–configuration-interaction (CI) calculations at full valence CI level as well as at the SDTQ-CI level on valence and Rydberg MOs were carried out on the potential energy hypersurfaces in the lower singlet states along one probable reaction path of the decomposition from SiH4 to 2SiH+2H+1H2. The result shows that there exists a one-step decomposition route which forms the radiative species SiH*(A 2Δ) from SiH4 spontaneously. The adiabatic potential energy hypersurfaces following the reaction path explain straightforwardly various observations in the plasma- and photo-CVD experiments of SiH4. The generation routes of SiH in other lower excited states were also clarified.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 6
    Digitale Medien
    Digitale Medien
    Springer
    Theoretical chemistry accounts 64 (1984), S. 403-413 
    ISSN: 1432-2234
    Schlagwort(e): Molecular interaction ; Basis set dependence of the stabilization energy ; Basis set superposition error ; Intermolecular force
    Quelle: Springer Online Journal Archives 1860-2000
    Thema: Chemie und Pharmazie
    Notizen: Abstract In order to elucidate the nature of the interaction force effected in perfluorochemical artificial blood, the basis set dependence of the stabilization energy between a model perfluorochemical and oxygen was investigated in detail. The basis set superposition error was removed in each case. The interaction was estimated to arise from dispersion forces.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 7
    Digitale Medien
    Digitale Medien
    New York, NY : Wiley-Blackwell
    International Journal of Quantum Chemistry 18 (1980), S. 157-164 
    ISSN: 0020-7608
    Schlagwort(e): Computational Chemistry and Molecular Modeling ; Atomic, Molecular and Optical Physics
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Chemie und Pharmazie
    Notizen: Adiabatic potential-energy surfaces in the lower excited states following the benzene⇌Dewar-benzene isomerization process were calculated by the INDO/S method postulating the concerted reaction mechanism which is proved to be valid in the ground state by the calculation of the intrinsic reaction coordinate. It was concluded that the benzene molecule in the 1B1u and 1E2u excited states readily isomerizes to Dewar-benzene in the condensed phase although the quantum yield may not be large. Bryce-Smith's proposal, that the isomerization to Dewar-benzene occurs only after the intersystem crossing to the 3B1u state in benzene molecule, will not be probable; for the 3B1u route is not favorable to the isomerization in comparison with these singlet routes. However, the rearomatization of Dewar-benzene in the ground state may produce the 3B1u benzene in small yield with higher yield of the ground-state benzene. The activation energy in the rearomatization is calculated to be 19.03 kcal/mol. These conclusions are consistent with the experimental facts. Molecular orbital correlations in the isomerization and the ionization potentials of Dewar-benzene were also discussed.
    Zusätzliches Material: 8 Ill.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 8
    Digitale Medien
    Digitale Medien
    Bognor Regis [u.a.] : Wiley-Blackwell
    Journal of Polymer Science Part A: Polymer Chemistry 35 (1997), S. 77-89 
    ISSN: 0887-624X
    Schlagwort(e): poly(phthalaldehyde) ; degradation mechanism ; molecular orbital theory ; activation energy of degradation ; acid catalyzed degradation ; unzipping reaction ; resist ; chemical amplification ; Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Chemie und Pharmazie
    Notizen: The acid-catalyzed degradation mechanism of chemical amplification resists based on end-capped poly(phthalaldehyde) has been elucidated by semi-empirical molecular orbital calculations. It is concluded that: (i) two different starting points exist in the degradation of end-capped poly(phthalaldehyde), the central part of the polymer as well as the polymer end; (ii) in both cases, after the first protonation, cationic hydroxyl compounds generated decompose to the identical cation intermediate, which can unzip itself to phthalaldehyde monomers successively (unzipping reaction); (iii) the hemiacetal type intermediates hardly degrade to the same intermediate without acid catalyst; (iv) the overall activation energy for the degradation reaction is less than 14 kcal/mol in all the cases. Thus, the poly(phthalaldehyde) resist can easily self-develop below 100°C, as reported in the literature. © 1997 John Wiley & Sons, Inc.
    Zusätzliches Material: 16 Ill.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 9
    Digitale Medien
    Digitale Medien
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 26 (1986), S. 1148-1152 
    ISSN: 0032-3888
    Schlagwort(e): Chemistry ; Chemical Engineering
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Chemie und Pharmazie , Maschinenbau , Physik
    Notizen: Dry developable resists comprised of poly(methyl isopropenyl ketone) (PMIPK) and 4-methyl-2,6-dI-(4′-azldoben-zylidene)-cyclohexanone-1 gave excellent results in SK lithography, i. e., high aspect ratio resist patterns with vertical walls were easily obtained by maskless dry etching in the single layer resist process. Because of the simplicity of single layer resist processing and the high etch rate in maskless dry etching for the formation of thick resist patterns, the dry developable resist in SR lithography may be advantageous to the multilayer resist for the purpose of generating high resolution, thick resist patterns with vertical walls. The resolution limit of the dry developable resist which reproduces the designed dimensions was 100 nm line and 200 nm space when a conventional e-beam apparatus was used at 20 KV in the dry developable multilayer resist process.
    Zusätzliches Material: 5 Ill.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 10
    Digitale Medien
    Digitale Medien
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 23 (1983), S. 993-999 
    ISSN: 0032-3888
    Schlagwort(e): Chemistry ; Chemical Engineering
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Chemie und Pharmazie , Maschinenbau , Physik
    Notizen: A dry developable negative working resist composition comprised of poly(methyl isopropenyl ketone) (PMIPK) and 4-methyl-2,6-di(4′-azido-benzylidene) cyclohexanone-1 was examined. The main photochemical product formed in the resist pattern was found to be a secondary amine which crosslinks PMIPK. Post-annealing forms a hydrogen-bonded product which shows a powerful electronic excitation energy quenching effect. The quencher is more powerful than the aromatic compound arising from the azide by post-annealing only. The residual resist thickness of the negative pattern is about 80 percent of the initial thickness of the coating in spite of all the azide compound remaining in the resist coating. The obtained dry developed resist pattern has a high dry etch resistance. Etchings of Si and SiO2 were performed by plasma and reactive ion etching, respectively.
    Zusätzliches Material: 12 Ill.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
Schließen ⊗
Diese Webseite nutzt Cookies und das Analyse-Tool Matomo. Weitere Informationen finden Sie hier...