ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
In this letter, it is shown that micro-Raman spectroscopy allows easy, nondestructive determination of the C49 and C54 phase of titanium silicide with μm resolution within single structures with area dimensions down to 1×1 μm2 and along isolated line structures with widths down to 0.25 μm. The micro-Raman spectroscopy technique is used to study isolated 0.25–5-μm-wide TiSi2 lines with thicknesses as small as 16 nm that are formed in both crystalline Si and polycrystalline Si. The phase mapping ability of the technique is demonstrated on several 80-μm-long, 0.35-μm-wide TiSi2 lines that are part of four-terminal line resistance devices created using complementary metal–oxide–semiconductor processing. © 1997 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.118833
