ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
A technologically useful chemical vapor deposition process with high growth rate ((approximately-greater-than)4 μm/h) was developed for the epitaxial growth of YBa2Cu3O7−x (YBCO) thin films. Even at the high growth rate used in this process, a spiral growth mechanism was observed and the films grown had electrical (Tc=92 K, Jc of 2×106A/cm2 at 77 K) and structural properties equal to films produced by physical vapor deposition.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.108914