Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
85 (1999), S. 6929-6931
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Heteroepitaxial ternary CoxY1−xSi1.7 silicide (x〉0.27) has been formed by Co implantation into YSi1.7/Si(111). The formation of this compound is confirmed by an x-ray symmetric θ–2θ scan. However, the θ–2θ scan alone cannot discriminate between the possible phases (tetragonal, orthorhombic, or hexagonal) of this compound. On the other hand, Rutherford backscattering (RBS)/channeling confirms that this silicide is hexagonal and that its azimuthal orientation is CoYSi1.7[0001]//Si[111] and CoYSi1.7{112¯0}//Si{110}. In addition, the lattice constants of the ternary silicide aepi=0.3989 nm (which means that the lattice mismatch is 〉3.9% relative to the Si substrate) and cepi=0.3982 nm have been determined by RBS/channeling and x-ray diffraction. © 1999 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.370108
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