Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
83 (1998), S. 7482-7487
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Absolute density and reaction kinetics of fluorine (F) atoms in high-density octafluorocyclobutane (c-C4F8) plasmas were examined using vacuum ultraviolet absorption spectroscopy. The F atom densities, corresponding to electron densities ranging from 1×1011 to 5×1012 cm−3, were 1×1012–5×1013 cm−3 for gas pressures of 2–7 mTorr and rf powers of 0.2–1.5 kW. The F atom density was linearly dependent on the electron density for ne〈1.5×1012 cm−3. According to lifetime measurements in the afterglow, two decay processes were found in the F atom density: exponential (first-order kinetics) and linear (zero-order kinetics) decay components. The linear-decay component became significant at high gas pressures. The time constant of the exponential-decay component ranged from 5 to 100 ms, which corresponds to surface loss probabilities of 10−1–10−3. The surface loss probability varied inversely with the F atom density. © 1998 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.367511
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