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Metalorganic vapor phase epitaxy and characterization of boron-doped (Al,Ga)As (1992)

Tischler, M. A. ; Mooney, P. M. ; Parker, B. D. ; [et al.]

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 71 (1992), S. 984-992

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: The epitaxial growth of GaAs and (Al,Ga)As doped with boron (from diborane) and silicon was investigated to examine the effect of boron on (DX) centers in silicon-doped material. The addition of diborane to the growth of GaAs and (Al,Ga)As results in the superlinear incorporation of boron into the solid with a concurrent reduction in the growth rate. Boron incorporation also decreases as the growth temperature is increased. Additionally, the AlAs mole fraction increases with increasing diborane during (Al,Ga)As growth. The DX center was not eliminated in (Al,Ga)As by the addition of boron. The thermal stability of these materials was also investigated.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.351295

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