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Disilicide solid solutions, phase diagram, and resistivities. II. TaSi2-WSi2 (1987)

Gas, P. ; Tardy, J. ; LeGoues, F. K. ; [et al.]

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 61 (1987), S. 2203-2211

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: The preparation of TaSi2-WSi2 alloys from the reaction of Si with Ta-W films allows one to explore the constitution diagram of the TaSi2-WSi2 pseudobinary system. The structure of the alloys has been investigated by means of Rutherford backscattering, x-ray diffraction, and transmission electron microscopy. The "equilibrium'' phase diagrams for the system TaSi2-WSi2 and for TiSi2-WSi2 are compared in light of simple ideas of alloy theory based on the consideration of the electron to atom ratios. The resistivity of the alloys is analyzed in terms of what has been established about the transport properties of the disilicides and of possible contributions of structural defects, mostly stacking faults, to scattering processes.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.337981

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