ISSN:
1013-9826
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Methylsilsesquioxane films were formed on glass substrates by dropping a sol preparedfrom methyltriethoxysilane and then heat-treated in an oven. Nanoindentation test was performed toassess the elastoplastic properties of the films, including the relative residual depth ξr, Meyer hardnessHM, work-of-indentation WI and the elastic modulus E’. The values of ξr, HM and WI were obtained bya Berkovich indenter and E’ was determined by a spherical indenter on the basis of Hertz elastictheory. ξr decreased with the increase in the heat treatment time, whereas HM , WI and E’ significantlyincreased with the time. The changes in the mechanical properties with the heat treatment time wellreflected the evolution of the Si-O-Si network structure in methylsilsequioxane film
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/51/transtech_doi~10.4028%252Fwww.scientific.net%252FKEM.317-318.317.pdf
