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Digitale Medien

The effects of low-ionization-potential contaminants on thermal plasmas (1983)

Johnson, Dean C. ; Pfender, E.

Springer

Plasma chemistry and plasma processing 3 (1983), S. 259-273

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Details

ISSN: 1572-8986

Schlagwort(e): Electric arcs ; thermal plasmas ; contaminants ; modeling

Quelle: Springer Online Journal Archives 1860-2000

Thema: Chemie und Pharmazie , Maschinenbau , Technik allgemein

Notizen: Abstract Plasmas consisting of a high-ionization-potential component mixed with a low-ionization-potential contaminant are common in industrial processes. Modeling results are presented for a sodium-contaminated nitrogen plasma column operating either in a free-burning (low-temperature) mode or operating in a constricted (high-temperature) mode. At sufficiently high plasma temperatures, the behavior is dominated by the high-ionization-potential component's properties. The low-ionization-potential contaminant's properties determine the low-temperature plasma behavior even when the contaminant is present in relatively small quantities.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1007/BF00566024

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