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Digitale Medien

Surface reactivity and interface morphology for Ti growth on YBa2Cu3O7−x, Y2BaCuO5, and CuO (1990)

Meyer, H. M. ; Weaver, J. H. ; Goretta, K. C.

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 67 (1990), S. 1995-2002

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Details

ISSN: 1089-7550

Quelle: AIP Digital Archive

Thema: Physik

Notizen: X-ray photoemission results make it possible to compare Ti adatom reactivity with clean surfaces of CuO, Y2BaCuO5, and YBa2Cu3O7−x. Changes in the Ti 2p1/2,3/2 and O 1s core level emission during overlayer growth are related to surface reactions between the Ti adatoms and oxygen atoms leached from the substrates. The results show the growth of a TiO2-like reaction species at initial Ti depositions, the formation of Ti suboxides at intermediate coverages, and the onset of metallic behavior at higher Ti coverages. The Ti-O reaction products grow in a layer-by-layer fashion initially, but Ti metal overlayer growth occurs as clusters on this Ti-O reacted region. Substrate modifications associated with Ti-O reactions result in significant changes in the chemical environments of Cu, Ba, and Y for Y2BaCuO5 and YBa2Cu3O7−x.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1063/1.345580

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