Digitale Medien
s.l. ; Stafa-Zurich, Switzerland
Key engineering materials
Vol. 373-374 (Mar. 2008), p. 172-175
ISSN:
1013-9826
Quelle:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Thema:
Maschinenbau
Notizen:
This article summarizes briefly our recent research on low-temperature synthesis of TiN,TiN/Cu and TiN/Si films by using inductively coupled plasma assisted magnetron sputtering method.It is shown that the incorporation of high-flux low-energy ion irradiation during deposition stronglyaffects film growth, structure evolution, morphology and mechanical properties. A main attention isdevoted to the synthesis of superhard nanocomposite films at a low deposition temperature. In bothTiN/Cu and TiN/Si films the maximum hardness reaches a value higher than 40 GPa
Materialart:
Digitale Medien
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/57/transtech_doi~10.4028%252Fwww.scientific.net%252FKEM.373-374.172.pdf
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