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Digitale Medien

The examination of poly(5-hexene-2-one sulfone) as a positive-working photoresist (1977)

Himics, R. J. ; Ross, D. L.

Stamford, Conn. [u.a.] : Wiley-Blackwell

Polymer Engineering and Science 17 (1977), S. 350-352

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Details

ISSN: 0032-3888

Schlagwort(e): Chemistry ; Chemical Engineering

Quelle: Wiley InterScience Backfile Collection 1832-2000

Thema: Chemie und Pharmazie , Maschinenbau , Physik

Notizen: A novel photoresist material is described, consisting of a copolymer of 5-hexene-2-one and SO2, which performs with or without the addition of sensitizers. This photoresist forms non-tacky films that adhere well to silicon oxide without requiring thermal treatment. They also have useful sensitivity, can be developed to form highly-resolved images, are inert to conventional etchants, and are readily removed after etching. The synthesis, characterization, and a possible mechanism for photodegradation are presented.

Zusätzliches Material: 1 Ill.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1002/pen.760170603

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