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Digitale Medien

Three dimensional behavior of negative electron resists (1977)

Heidenreich, R. D. ; Kammlott, G. W.

Stamford, Conn. [u.a.] : Wiley-Blackwell

Polymer Engineering and Science 17 (1977), S. 377-380

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Details

ISSN: 0032-3888

Schlagwort(e): Chemistry ; Chemical Engineering

Quelle: Wiley InterScience Backfile Collection 1832-2000

Thema: Chemie und Pharmazie , Maschinenbau , Physik

Notizen: It is illustrated experimentally that swelling and deformation of narrow lines (width 〈 1 μm) is an important limitation on the fidelity and transverse resolution of negative electron resists. The thickness response curve developed for negative resists is discussed and the effect of feature size is introduced through the experimental parameter DgR, the rigid gel dose, or the dose required to initiate a free standing line of width 〈 0.2 μm. The transition from line to area exposure is discussed and the effect of substrate backscatter or transverse resolution in gratings is calculated. The observed resolution is 3-5 times the calculated value from swelling and deformation during development.

Zusätzliches Material: 4 Ill.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1002/pen.760170609

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