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  • 1
    Electronic Resource
    Electronic Resource
    New York, NY : Wiley-Blackwell
    International Journal of Chemical Kinetics 11 (1979), S. 1089-1096 
    ISSN: 0538-8066
    Keywords: Chemistry ; Physical Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: The thermal decomposition of SF5O3SF5 in the presence of CO has been investigated between -9.8°C and + 9.9°C. Besides traces of S2F10, equimolecular amounts of SF5O2SF5 and CO2 are formed. \documentclass{article}\pagestyle{empty}\begin{document}$$ {\rm SF}_{\rm 5} {\rm O}_{\rm 3} {\rm SF}_{\rm 5} {\rm + CO } \to {\rm SF}_{\rm 5} {\rm O}_{\rm 2} {\rm SF}_{\rm 5} {\rm + CO}_{\rm 2}{\rm,}\Delta _n {\rm = 0} $$\end{document} The reaction is homogeneous. Its rate is proportional to the pressure of the trioxide and in dependent of the total pressure, the pressure of inert gases and of carbon monoxide: \documentclass{article}\pagestyle{empty}\begin{document}$$ - {\rm }\frac{{d[{\rm SF}_5 {\rm O}_{\rm 3} {\rm SF}_5 ]}}{{dt}}{\rm = +}\frac{{d[{\rm SF}_5{\rm O}_{\rm 2} {\rm SF}_5 }}{{dt}} = {\rm}k[{\rm SF}_5 {\rm O}_{\rm 3}{\rm SF}_5 ] $$\end{document} where k = k1∞ = 1016.32±0.40 exp(-25,300 ± 500 cal)/RT sec-1. Consequently, \documentclass{article}\pagestyle{empty}\begin{document}$$ {\rm D}_{{\rm SF}_{\rm 5} {\rm O - O}_{\rm 2} {\rm SF}_{\rm 5}} {\rm =}25.3{\rm}\pm {\rm 0}{\rm .5 kcal} $$\end{document} In the presence of oxygen a sensitized CO2 formation is observed. A mechanism is given which explains the experimental results.
    Additional Material: 1 Ill.
    Type of Medium: Electronic Resource
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