ISSN:
1432-1858
Quelle:
Springer Online Journal Archives 1860-2000
Thema:
Elektrotechnik, Elektronik, Nachrichtentechnik
,
Technik allgemein
Notizen:
Abstract A method for fabricating a microstructure with a high aspect ratio has been developed. It uses a combination of fluorinated polyimide and silicone-based positive photoresist, which reduces the number of process steps and the turn-around time. This fabrication method is applicable to optical micromachines and IC probes.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1007/s005420000046