ISSN:
1435-1536
Source:
Springer Online Journal Archives 1860-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Description / Table of Contents:
Zusammenfassung Vergleichende Adsorptionsdaten von Freon 113 (1,1,2 Trichlor- 1,2,2 Trifluoräthan) und Krypton an Graphon zeigten ein sehr ähnliches Adsorptionsverhalten im gesamten untersuchten Druckbereich. Ein Freon 113-Molekül beansprucht etwa die 2 1/2-fache Fläche eines Krypton-Moleküls und orientiert sich mit seiner Dipolachse senkrecht zur Graphonoberfläche. Zusätzliche Adsorptionsdaten zeigen, daß das ähnliche Inertverhalten von Krypton und Freon 113 auch bei energetisch heterogenen Oberflächen wie Anatas, Silicium und wasserbedecktem Siliciumdioxid auftritt.
Notes:
Summary Comparative adsorption data for Freon 113 (1,1,2 trichloro-1,2,2 trifluoroethane) and krypton on Graphon, presented in the preceding paper, showed that the adsorption behavior for krypton, measured at 104–120 K, and Freon 113, measured at 250–370 K, were very similar over the entire pressure range studied. The Freon 113 molecule was shown to adsorb with approximately 2.5 times the molecular area of krypton and to orient with its dipole axis perpendicular to the Graphon surface. Additional adsorption data gathered here indicate that the similar inert behavior of krypton and Freon 113 is also shown on heterogeneous energetic surfaces — anatase, silicon and water covered silica. Surface pressures (π) calculated for Freon 113 on surfaces exhibiting low heats of adsorption are approximately equal to the liquid surface tension, while for surfaces with high heats of adsorption, π can be twice as large.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF01602779
