ZIB

Treffer pro Seite

Treffer 1 - 1 | 1 Treffer

Alles auswählen Exportieren

Digitale Medien

Noninvasive measurement of charging in plasmas using microelectromechanical charge sensing devices (1996)

Pangal, Kiran ; Firebaugh, Samara L. ; Sturm, James C.

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 69 (1996), S. 1471-1473

zur Merkliste hinzufügen auf der Merkliste

Details

ISSN: 1077-3118

Quelle: AIP Digital Archive

Thema: Physik

Notizen: The plasma induced charging of surfaces in a plasma during semiconductor processing has been measured noninvasively using microelectromechanical devices. We have designed, modeled, and fabricated microcantilevers to act as charge sensing probes. The devices exhibit a mechanical deformation when charged, which is probed in situ by optical techniques, or measured by optical inspection after removal from plasma. Charging voltage measurements in a parallel-plate reactive-ion-etching reactor show that more charging is evident at the electrode edge, and that the charging is a strong function of input rf power, chamber pressure, and flow rate of gases. © 1996 American Institute of Physics.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1063/1.116911

Bibliothek	Standort	Signatur	Band/Heft/Jahr	Verfügbarkeit

Andere fanden auch interessant ...

Artikel (Nationallizenzen)

Volltext

Treffer 1 - 1 | 1 Treffer