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Ultrathin film deposition of Ba1−xRbxBiO3 by molecular beam epitaxy using distilled ozone (1993)

Ogihara, M. ; Makita, T. ; Abe, H.

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 63 (1993), S. 2694-2696

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: A Ba1−xRbxBiO3 (BRBO) ultrathin film (120 A(ring)) with a zero-resistance transition temperature of 14 K was deposited on a SrTiO3(110) substrate by molecular beam epitaxy using distilled ozone. The critical current density of 2×105 A/cm2 was achieved in 200-A(ring)-thick BRBO thin film, and this observed critical current density is much larger than the previously reported data. The dependence of BRBO film properties on film thickness is studied for the first time.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.110397

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