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Electrical resistance of electron beam induced deposits from tungsten hexacarbonyl (1993)

Hoyle, P. C. ; Ogasawara, M. ; Cleaver, J. R. A. ; [et al.]

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 62 (1993), S. 3043-3045

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: We studied the change in electrical conductivity of deposits from focused electron beam induced dissociation of W(CO)6 for different exposure conditions. Lines were deposited by scanning repeatedly to build up the same total electron dose; with different electron doses per scan, resistance differences of more than one order of magnitude resulted. The lines with lower deposited thicknesses also have lower resistances, and so cannot be explained in terms of constant resistivity and different cross-sectional areas. A theoretical description involving an intermediate and a final product is proposed and compared to the experimental results.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.109133

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