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    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 6421-6426 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have recorded, in the energy range of ∼4–11 eV, radiation from electron cyclotron resonance microwave plasmas generated when coupling microwave energy in a number of gases and gas mixtures appropriate for plasma deposition or etching. Molecular, atomic, and ionic emissions are observed in this range attesting to the major collisional processes (dissociation, excitation, and ionization) with hot electrons. The neutral atom temperature has been measured by standard spectroscopic techniques and found to be in the range of 0.1–0.3 eV, much lower than the electron temperature of the same plasmas. The main discharge parameters (i.e., gas pressure, flow rate, microwave power) have been varied to interpret their influence on the plasma radiation in terms of plasma parameters.
    Type of Medium: Electronic Resource
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