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Partially ionized beam deposition of Ag films on insulating substrates (1995)

Soss, S. R. ; Cook, C. A. ; Lu, T.-M.

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 77 (1995), S. 2735-2738

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: A partially ionized beam deposition technique which utilizes a small fraction of self-ions during deposition is used to grow thin Ag films (∼1200 A(ring)) on glass substrates. It is shown that due to substrate charging the Ag film is discontinuous and has inferior structural and electrical properties. This difficulty was overcome by using an oscillatory substrate bias so that electron showers are directed toward the surface to neutralize the substrate during deposition. We show that this scheme of deposition can produce thin and continuous Ag films on glass with bulk-like resistivity with a substrate bias of (approximately-greater-than)1.3 kV. This deposition technique opens up the possibility of coating high-quality metal films on insulators for optical and electronic applications. © 1995 American Institute of Physics.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.358742

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