ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The retardation phenomenon of oxygen precipitation in Czochralski silicon has been studied simultaneously with the growth of surface stacking faults under a silicon nitride capping layer. The surface faults were intentionally introduced to monitor the bulk self-interstitial supersaturation in the crystal during precipitate growth. It was observed that an increase in the low-temperature nucleation anneal time resulted in a reduced rate of oxygen precipitation and an enhanced rate of surface stacking fault growth at high temperatures. This indicates that as the nucleation anneal time increases, silicon self-interstitials, which must be generated for precipitation to proceed, reach a high level of supersaturation and cause the annihilation of most nuclei generated during the nucleation anneal.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.343303