Library

Your email was sent successfully. Check your inbox.

An error occurred while sending the email. Please try again.

Proceed reservation?

Export
  • 1
    Electronic Resource
    Electronic Resource
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 90 (1989), S. 7442-7447 
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: We report evidence for the coexistence of direct and precursor dynamics in the dissociative chemisorption of H2 on Ni(l00). Hydrogen and deuterium uptakes on Ni(l00) were measured at various surface temperatures by following the secondary ion ratios, Ni2 H+/Ni+ and Ni2 D+/Ni+ , which are proportional to surface hydrogen and deuterium coverage on both clean and carbon-covered Ni(100). Between 100 and 200 K on clean Ni(l00), the initial sticking coefficient of hydrogen decreases, but only slightly, as the surface temperature increases. The decrease is more pronounced both in the presence of predosed carbon and for deuterium adsorption on Ni(100). This is interpreted as due to the involvement at low temperatures of a molecular precursor which mediates dissociative adsorption at low temperatures. The precursor probably involves surface defects and sites formed in the presence of carbon. In addition to the precursor channel, a direct dissociation channel also operates, and dominates for T≥200 K.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
Close ⊗
This website uses cookies and the analysis tool Matomo. More information can be found here...