Electronic Resource
College Park, Md.
:
American Institute of Physics (AIP)
The Journal of Chemical Physics
115 (2001), S. 3287-3296
ISSN:
1089-7690
Source:
AIP Digital Archive
Topics:
Physics
,
Chemistry and Pharmacology
Notes:
The mechanism of the cycloaddition reaction between thiophene and Si(111)-7×7 has been investigated using thermal desorption spectroscopy (TDS), high resolution electron energy loss spectroscopy (HREELS), electronic electron energy loss spectroscopy (EELS), scanning tunneling microscopy (STM), and PM3 semiempirical calculations. The results show that thiophene binds on Si(111)-7×7 through a [4+2] cycloaddition reaction between the 2, 5 C-atoms of thiophene and the adjacent adatom-rest atom pairs on Si(111)-7×7. Semiempirical PM3 calculations based on the cluster model further confirm this di-σ bonding configuration. A stepwise surface diradical mechanism has been proposed to account for the regioselective [4+2] cycloaddition reaction. © 2001 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1386435
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