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An improved automated anodization apparatus for fabricating nanostructure devices and porous silicon (2001)

Garman, C. ; Sines, P. ; McGinnis, S. P. ; [et al.]

[S.l.] : American Institute of Physics (AIP)

Review of Scientific Instruments 72 (2001), S. 275-277

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ISSN: 1089-7623

Source: AIP Digital Archive

Topics: Physics , Electrical Engineering, Measurement and Control Technology

Notes: This note describes an improved anodization apparatus that provides enhanced safety and efficiency, and is suitable for large-scale volume production. The improved anodization apparatus also provides increased electrolyte temperature control, and allows flexibility in the size and shape of the substrate. Overall, this equipment will find wide applications in the fabrication of template-based semiconductor nanostructures, porous silicon, and other devices that require electrochemical processing. © 2001 American Institute of Physics.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.1326924

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