ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
The atmospheric environmental exposure system for synchrotron radiation (SR) lithography has been integrated using the Photon Factory storage ring (2.5 GeV). The system, composed of a highly reliable beamline, an SR extracting chamber and a prototype SR stepper, aims at attaining higher accuracy and throughput. Based on a fail-safe mechanism notion, a double-vacuum protection system, in which two sets of a fast closing valve and acoustic delay line are installed in the main beamline and branch beamline, respectively, has been organized. Vacuum breakdown tests indicated that any vacuum breakdown, a beryllium (Be) window rupture in the worst case, exerts little influence on the storage ring ultrahigh vacuum. The SR extracting chamber, equipped with a Be window and an extraction window, is filled with helium at atmospheric pressure. Particularly, the 50-μm-thick, 35-mm-diam Be window, vacuum-sealed by a Viton O-ring, was preliminarily employed and, so far, has operated successfully, giving a 25-mm square exposure area. In terms of practical availability and simplicity, the SR stepper in an atmospheric environment has been constructed. A novel differential mode linear Fresnel zone plate alignment method, which can detect an alignment error between a mask and a wafer during exposure, was developed.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1141050
