ISSN:
1662-9779
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Physics
Notes:
Effect of hydrostatic pressure (HP) on out – annealing of defects in self – implanted silicon (Si:Si, Si+ doses 5x1016 cm-2 and 1x1017 cm-2, energies 50 keV and 160 keV), treated for 1 – 10 h at up to 1400 K (HT) under HP ≤ 1.4 GPa, has been investigated by photoluminescence, X-ray and related methods.Applied at 720 – 1270 K enhanced pressure does not affect or affects adversely Si:Si structure while at 1400 K assists in its improvement. HP – dependent transformations in Si:Si at HT are related to effect of HP on diffusion of point defects, such as silicon interstitials and vacancies produced at implantation. Out - annealing of defects in self - implanted silicon is dependent also on spatial position of damaged areas in Si substrate
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/21/transtech_doi~10.4028%252Fwww.scientific.net%252FSSP.108-109.351.pdf
