Electronic Resource
s.l. ; Stafa-Zurich, Switzerland
Solid state phenomena
Vol. 121-123 (Mar. 2007), p. 377-380
ISSN:
1662-9779
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Physics
Notes:
This work describes the combination of photolithography and self-assembly methods forfabrication of 3D photonic crystals (PCs) with well-defined micron-scale line defects embedded inthe PCs. Line defects with different dimensions, shapes, and compositions have been introduced intothe 3D PCs by choosing different photoresists, masks, and template-directed assembly techniques.Infiltration of carbon using high-temperature chemical vapor deposition (CVD) technique showedthat the fabrication procedure offers an ideal approach to functional 3D photonic devices fromself-assembled photonic crystals
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/23/transtech_doi~10.4028%252Fwww.scientific.net%252FSSP.121-123.377.pdf
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