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  • Articles: DFG German National Licenses  (2)
  • 1990-1994  (2)
  • 1993  (2)
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  • Articles: DFG German National Licenses  (2)
Material
Years
  • 1990-1994  (2)
Year
  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 4983-4989 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have measured Raman scattering and high-resolution x-ray diffraction from highly strained [(InAs)4(InP)4]N short-period superlattices grown on InP substrates by atomic layer epitaxy at 355 °C. The InAs and InP confined phonons are observed in these highly strained short-period superlattices. The energy of the InAs confined longitudinal-optical phonon (LO) modes of a fully strained superlattice (with N=8) is blue shifted by about 10 cm−1 compared to the LO phonon of bulk InAs. This effect is explained by the large biaxial strain existing in the InAs layers. The observed frequency shift agrees with the lattice-mismatch strain given by elasticity theory and independently measured by high-resolution x-ray diffraction. No evidence of a frequency shift of the InP confined LO modes in the N=8 fully strained superlattice is observed, indicating that the strain is confined to the InAs layers. We show that in a partially relaxed superlattice (with N=20), the InAs layers are in compression, while the InP layers are in tension. In this case the InP confined LO1 phonons are red shifted by about 3 cm−1 compared to the InP LO1 phonons of the N=8 fully strained superlattice, and the shift of the InAs confined LO phonons with respect to the LO phonons of bulk InAs is also reduced.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 62 (1993), S. 2375-2377 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: High-resolution x-ray diffraction (HRXRD) can be used to quickly and precisely evaluate the self-limiting growth of atomic layer epitaxy (ALE) of III-V compounds and heterostructures. We have studied atomic layer epitaxy of InP and InAs/InP heterostructures in a conventional low pressure metalorganic vapor phase epitaxy reactor. We used the interference of x-ray wave fields in the grown structures to measure nondestructively the thickness of the deposited film with relatively high precision. A self-limiting growth close to 1 monolayer/cycle has been obtained for InP and InAs with a substrate temperature as low as 350–360 °C. HRXRD and photoluminescence measurements have demonstrated the structural and optical high quality of ALE-grown InP and InAs/InP heterostructures.
    Type of Medium: Electronic Resource
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