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  • Articles: DFG German National Licenses  (4)
  • 1990-1994  (4)
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  • Articles: DFG German National Licenses  (4)
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Year
  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 4344-4350 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Indium tin oxide (ITO) films deposited on single-crystal Si wafers by the electron-beam-(EB) evaporation method have been investigated by x-ray photoelectron spectroscopy (XPS) together with work-function and resistivity measurements. The XPS studies suggest that all the ITO films consist of crystalline and amorphous phases. The amount of the crystalline phase with respect to the amorphous phase for the ITO films, deposited with the incident angle of the ITO vapor to the Si substrate θi at 0°, is smaller than that for the ITO films deposited at θi=45°. The amount of the crystalline phase hardly depends on the conditions of postdeposition heat treatments, while that of the amorphous phase increases by raising the temperature of the heat treatments. Metal indium present in the films deposited at θi=0° is transformed into amorphous indium oxide by heating at 450 °C in air. Metal tin is also present near the ITO/Si interface for the ITO films deposited at θi=0°. The work function of the ITO films deposited at θi=0° is lower by 0.8 eV in maximum than that for the films deposited at θi=45°. It is concluded that the work function of the ITO films increases not only with a decrease in the amount of metal indium and metal tin in the films but also with an increase in the amount of the crystalline ITO phase with respect to that of the amorphous phase.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 1736-1743 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The carrier transport mechanism of the Si solar cells having n-Si/indium tin oxide (ITO) junctions has been studied by use of the current-voltage and capacitance-voltage measurements and x-ray photoelectron spectroscopy. An 11-A(ring)-thick nonstoichiometric Si oxide layer is formed when ITO is deposited by spray pyrolysis on a Si electrode etched with hydrofluoric acid. In this case, the tunneling probability of majority carriers through the oxide layer is high, and the thermionic emission current over the energy barrier in Si takes a dominant part of the dark current. On the other hand, for a Si electrode where a Si oxide layer is intentionally interposed between ITO and Si, the thermionic emission current is suppressed, and trap-assisted multistep tunneling through the depletion layer becomes dominant. By making a mat-structure treatment on the Si surface, a solar energy conversion efficiency of 13% and the photocurrent density of 42.5 mA cm−2 were attained under AM 1 100 mW cm−2 illumination.
    Type of Medium: Electronic Resource
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  • 3
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Indium tin oxide (ITO)/silicon oxide/silicon (Si) junction solar cells were produced by depositing ITO on a thin silicon oxide-covered single-crystal Si substrate using the electron-beam evaporation method. The current-voltage (I-V) characteristics strongly depended on the incident angle (θi) of the evaporated ITO vapor to the Si substrate during the ITO deposition, as well as the post-deposition heating temperature (Th) and the kind of the ambient gases during post-deposition heat treatment. The ITO films deposited at θi=0° and treated at Th=380 °C in air formed a high-energy barrier with p-Si, and formed ohmic contact with n-Si. X-ray diffraction analysis showed that the ITO films deposited at θi=0° contained metal indium. The amount of the metal indium decreased either by reducing the deposition rate of the ITO film or by raising the substrate temperature during the ITO deposition. The ITO films deposited at θi=45° and treated at Th=350∼450 °C in hydrogen, on the other hand, formed a high-energy barrier with n Si. In this case, no metal indium was observed in the ITO films. It is concluded that the formation of the metal indium in the ITO films changes their work functions, and thus its presence strongly affects the I-V characteristics of the ITO/silicon oxide/Si solar cells. Darkening observed for the ITO films deposited at θi=0° is also attributed to the presence of the metal indium.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 4756-4761 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Indium-tin-oxide (ITO)/silicon oxide/mat-textured n-Si junction solar cells having an energy conversion efficiency of 15% are fabricated by the spray pyrolysis method. Their characteristics and the junction properties are compared with the same junction solar cells having a flat Si surface. In cases where the ITO film is deposited on a hydrofluoric acid-etched mat-textured Si surface, the open circuit photovoltage (Voc) is low (405 mV). Scanning electron microscopy observation shows that high-density dislocations are formed near the Si surface, and the temperature dependence of the current-voltage characteristics suggests that the trap-assisted multistep tunneling through the Si depletion layer is a dominant current flow mechanism. In cases where the ITO film is deposited on a thermal silicon oxide-covered mat-textured Si surface, the formation of the dislocations is suppressed, and consequently Voc is increased to 485 mV. For this solar cell, a surface recombination current takes the dominant part of the dark current in the bias region below ∼250 mV, and a thermionic-assisted tunneling current is dominant in the higher bias region. For a cell where the thermal silicon oxide-covered mat-textured Si surface is annealed at 800 °C under nitrogen before the deposition of the ITO film, Voc is further increased to 540 mV, and the energy conversion efficiency of 15% is achieved. In this case, the thermionic-assisted tunneling current density is decreased by an increase in the barrier height due probably to a reduction in the density of the positive charge in the silicon oxide layer. The surface recombination current density is also reduced by the removal of interface states, leading to the improvement of the fill factor.
    Type of Medium: Electronic Resource
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