ISSN:
1662-9752
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
The magnetotransport properties of the electroplated and sputtered Bi thin films have beeninvestigated in the range 4 – 300 K. A marked increase from 5,200 % to 80,000 % in the ordinarymagnetoresistance (MR) for the electroplated Bi thin film was observed after thermal anneal at 4 K.The MR ratios for the as-grown and the annealed Bi thin films were found to exhibit 560 % and 590%, respectively, at 300 K. On the other hand, the MR for the sputtered Bi film grown by sputteringwas hardly observed at 4 and 300 K, whereas the MR ratios after anneal were found to reach 30,000 %at 4 K and 600 % at 300 K. We find that the room temperature MR in the sputtered films depends onthe trigonal-axis oriented microstructures and grain size, in contrast to the electroplated films. Ourresults demonstrate the very large room temperature MR in the electroplated and sputtered Bi thinfilms, which can be used for spintronic device applications
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/08/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.449-452.1061.pdf
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